Dr. Lei Wan
at Western Digital Corp
SPIE Involvement:
Author
Publications (4)

SPIE Journal Paper | 7 August 2012
JM3 Vol. 11 Issue 3
KEYWORDS: Nanoimprint lithography, Chromium, Reactive ion etching, Lithography, Silicon, Double patterning technology, Electron beam lithography, Polymethylmethacrylate, Magnetism, Directed self assembly

Proceedings Article | 21 March 2012
Proc. SPIE. 8323, Alternative Lithographic Technologies IV
KEYWORDS: Lithography, Electron beam lithography, Silicon, Magnetism, Chromium, Oxygen, Directed self assembly, Double patterning technology, Nanoimprint lithography, Reactive ion etching

Proceedings Article | 21 March 2012
Proc. SPIE. 8323, Alternative Lithographic Technologies IV
KEYWORDS: Lithography, Optical lithography, Etching, Silicon, Chromium, Directed self assembly, Double patterning technology, Reactive ion etching, Beam propagation method, Plasma

Proceedings Article | 14 October 2011
Proc. SPIE. 8166, Photomask Technology 2011
KEYWORDS: Oxides, Lithography, Electron beam lithography, Sensors, Etching, Silicon, Magnetism, Scanning electron microscopy, Head, Beam propagation method

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