DFB LDs are key components in DWDM optical network. Now they are very expensive because the
feedback grating period has to be controlled with very high accuracy and EBL is currently the most
popular solution. We propose a high throughput, low cost NIL process based on a large stamp fabricated
by SFIL and soft stamp pattern transfer method. DFB chips on 30mm*30mm area were manufactured
with both good uniformity and performance. 13 ITU channels from 1540nm to 1560nm of 200GHz space
are made. Our results show NIL has high potential to become another popular technology for DFB LD
production, this cost effective and high efficiency manufacture solution may yield a significant impact to
the future optical communication industry development.
Nano-devices are increasingly required, the fabrication cost of nano-devices is quite high due to high resolution
requirement. Nanoimprint lithography(NIL) is a promising technology for nano devices fabrication due to its low cost
and high resolution. However, it still suffers from the large area uniformity and imprint defects problems. Herein,
temperature-pressure variation soft press process are used in Simultaneous Thermal and UV (STU) imprint to enhance
the uniformity and quality of pattern. This method is used to pattern high quality photonic crystals and gratings.