Lei Wang
at Shanghai Hua Hong NEC Electronics Co Ltd
SPIE Involvement:
Author
Publications (2)

Proceedings Article | 23 March 2007
Proc. SPIE. 6519, Advances in Resist Materials and Processing Technology XXIV
KEYWORDS: Image processing, Diffusion, Computer simulations, Photoresist materials, Photomasks, Optical proximity correction, Critical dimension metrology, Algorithm development, Photoresist processing, Binary data

Proceedings Article | 24 March 2006
Proc. SPIE. 6152, Metrology, Inspection, and Process Control for Microlithography XX
KEYWORDS: Thin films, Lithography, Optical lithography, Etching, Image processing, Particles, Photomasks, Photoresist processing, Semiconducting wafers, Chemical mechanical planarization

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