Lei Yan
at Shanghai Huali Microelectronics Corp
SPIE Involvement:
Author
Publications (1)

Proceedings Article | 20 March 2019
Proc. SPIE. 10962, Design-Process-Technology Co-optimization for Manufacturability XIII
KEYWORDS: Optical lithography, Defect detection, Etching, Image processing, Scanning electron microscopy, Process control, Wafer inspection, Semiconducting wafers, Process engineering, Chemical mechanical planarization

SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top