Dr. Lena V. Zavyalova
Engineer at Synopsys Inc
SPIE Involvement:
Author
Publications (34)

PROCEEDINGS ARTICLE | March 31, 2014
Proc. SPIE. 9052, Optical Microlithography XXVII
KEYWORDS: Lithography, Data modeling, Calibration, Etching, 3D modeling, Integrated modeling, Photomasks, Optical proximity correction, Photoresist processing, Semiconducting wafers

PROCEEDINGS ARTICLE | April 12, 2013
Proc. SPIE. 8683, Optical Microlithography XXVI
KEYWORDS: Lithography, Data modeling, Calibration, Etching, 3D modeling, Scanning electron microscopy, Optical proximity correction, Semiconducting wafers, Statistical modeling, 3D image processing

PROCEEDINGS ARTICLE | April 8, 2011
Proc. SPIE. 7969, Extreme Ultraviolet (EUV) Lithography II
KEYWORDS: Lithography, Reticles, Optical lithography, Cadmium, Calibration, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Critical dimension metrology, Semiconducting wafers

PROCEEDINGS ARTICLE | March 23, 2010
Proc. SPIE. 7636, Extreme Ultraviolet (EUV) Lithography
KEYWORDS: Point spread functions, Reticles, Optical lithography, Data modeling, Calibration, 3D modeling, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Optical proximity correction

PROCEEDINGS ARTICLE | March 10, 2010
Proc. SPIE. 7640, Optical Microlithography XXIII
KEYWORDS: Data modeling, Calibration, Molecules, Diffusion, Optical proximity correction, Photoresist processing, Semiconducting wafers, Process modeling, Fiber optic illuminators, Chemically amplified resists

PROCEEDINGS ARTICLE | March 18, 2009
Proc. SPIE. 7271, Alternative Lithographic Technologies
KEYWORDS: Diffraction, Optical lithography, Scanners, 3D modeling, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Optical proximity correction, Convolution, TCAD

Showing 5 of 34 publications
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