Mr. Leo P. McArdle
Photo Equipment Manager at Broadcom Ltd
SPIE Involvement:
Author
Publications (2)

PROCEEDINGS ARTICLE | May 28, 2004
Proc. SPIE. 5377, Optical Microlithography XVII
KEYWORDS: Thin films, Lithography, Sensors, Platinum, Temperature sensors, Critical dimension metrology, Photoresist processing, Semiconducting wafers, 193nm lithography, Temperature metrology

PROCEEDINGS ARTICLE | May 14, 2004
Proc. SPIE. 5376, Advances in Resist Technology and Processing XXI
KEYWORDS: Lithography, Logic, Etching, Polymers, Metals, Chemistry, Photoresist materials, Semiconducting wafers, 193nm lithography, Industrial chemicals

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