Leo P. McArdle
Photo Equipment Manager at Broadcom Inc
SPIE Involvement:
Author
Publications (2)

Proceedings Article | 28 May 2004
Proc. SPIE. 5377, Optical Microlithography XVII
KEYWORDS: Semiconducting wafers, Sensors, Temperature metrology, Lithography, Photoresist processing, Critical dimension metrology, Platinum, Temperature sensors, 193nm lithography, Thin films

Proceedings Article | 14 May 2004
Proc. SPIE. 5376, Advances in Resist Technology and Processing XXI
KEYWORDS: Etching, Lithography, 193nm lithography, Industrial chemicals, Semiconducting wafers, Metals, Photoresist materials, Polymers, Chemistry, Logic

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