Lev Faivishevsky
at Applied Materials
SPIE Involvement:
Author
Publications (5)

Proceedings Article | 28 October 2009
Proc. SPIE. 7488, Photomask Technology 2009
KEYWORDS: Reticles, Metrology, Calibration, Scanners, Scanning electron microscopy, Photomasks, Acquisition tracking and pointing, Critical dimension metrology, Semiconducting wafers, Airborne remote sensing

Proceedings Article | 7 October 2009
Proc. SPIE. 7488, Photomask Technology 2009
KEYWORDS: Optical lithography, Data modeling, Calibration, Databases, Image processing, Scanners, Inspection, Photomasks, Airborne remote sensing, Process modeling

Proceedings Article | 30 September 2009
Proc. SPIE. 7488, Photomask Technology 2009
KEYWORDS: Wafer-level optics, Defect detection, Detection and tracking algorithms, Data modeling, Scanners, Inspection, Transform theory, Photomasks, Semiconducting wafers, Airborne remote sensing

Proceedings Article | 24 March 2009
Proc. SPIE. 7272, Metrology, Inspection, and Process Control for Microlithography XXIII
KEYWORDS: Lithography, Phase shifting, Manufacturing, Inspection, Image acquisition, Photomasks, Critical dimension metrology, Semiconducting wafers, Airborne remote sensing, Resolution enhancement technologies

Proceedings Article | 17 October 2008
Proc. SPIE. 7122, Photomask Technology 2008
KEYWORDS: Optical imaging, Edge detection, Sensors, Databases, Image processing, Microscopy, Inspection, Scanning electron microscopy, Photomasks, Critical dimension metrology

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