Lev Faivishevsky
at Applied Materials
SPIE Involvement:
Author
Publications (5)

PROCEEDINGS ARTICLE | October 28, 2009
Proc. SPIE. 7488, Photomask Technology 2009
KEYWORDS: Reticles, Metrology, Calibration, Scanners, Scanning electron microscopy, Photomasks, Acquisition tracking and pointing, Critical dimension metrology, Semiconducting wafers, Airborne remote sensing

PROCEEDINGS ARTICLE | October 7, 2009
Proc. SPIE. 7488, Photomask Technology 2009
KEYWORDS: Optical lithography, Data modeling, Calibration, Databases, Image processing, Scanners, Inspection, Photomasks, Airborne remote sensing, Process modeling

PROCEEDINGS ARTICLE | September 30, 2009
Proc. SPIE. 7488, Photomask Technology 2009
KEYWORDS: Wafer-level optics, Defect detection, Detection and tracking algorithms, Data modeling, Scanners, Inspection, Transform theory, Photomasks, Semiconducting wafers, Airborne remote sensing

PROCEEDINGS ARTICLE | March 24, 2009
Proc. SPIE. 7272, Metrology, Inspection, and Process Control for Microlithography XXIII
KEYWORDS: Lithography, Phase shifting, Manufacturing, Inspection, Image acquisition, Photomasks, Critical dimension metrology, Semiconducting wafers, Airborne remote sensing, Resolution enhancement technologies

PROCEEDINGS ARTICLE | October 17, 2008
Proc. SPIE. 7122, Photomask Technology 2008
KEYWORDS: Optical imaging, Edge detection, Sensors, Databases, Image processing, Microscopy, Inspection, Scanning electron microscopy, Photomasks, Critical dimension metrology

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