Lev Merkushov
SPIE Involvement:
Author
Publications (3)

Proceedings Article | 23 March 2020 Paper
Proc. SPIE. 11324, Novel Patterning Technologies for Semiconductors, MEMS/NEMS and MOEMS 2020
KEYWORDS: Lithography, Diffraction, Holograms, Holography, 3D image reconstruction, Digital holography, Image quality, Software development, Photomasks, Algorithm development, Phase shifts

Proceedings Article | 23 March 2020 Paper
Proc. SPIE. 11324, Novel Patterning Technologies for Semiconductors, MEMS/NEMS and MOEMS 2020
KEYWORDS: Lithography, 3D image reconstruction, Digital holography, Spatial light modulators, Micromirrors, Photomasks, Maskless lithography

Proceedings Article | 23 March 2020 Paper
Proc. SPIE. 11324, Novel Patterning Technologies for Semiconductors, MEMS/NEMS and MOEMS 2020
KEYWORDS: Lithography, Holograms, Holography, Optical lithography, 3D image reconstruction, Digital holography, Image resolution, Photoresist materials, Photomasks

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