Dr. Levi D. Barnes
R&D Engineer at Synopsys Inc
SPIE Involvement:
Publications (17)

Proceedings Article | 25 September 2010 Paper
Proceedings Volume 7823, 78233R (2010) https://doi.org/10.1117/12.867247
KEYWORDS: Optical proximity correction, Photomasks, Calibration, Manufacturing, Semiconducting wafers, Tolerancing, Diffraction, Image processing, Critical dimension metrology, Immersion lithography

Proceedings Article | 4 March 2010 Paper
Myung-Soo Noh, Beom-Seok Seo, Suk-Joo Lee, Alex Miloslavsky, Christopher Cork, Levi Barnes, Kevin Lucas
Proceedings Volume 7640, 76400S (2010) https://doi.org/10.1117/12.848194
KEYWORDS: Double patterning technology, Optical lithography, Photomasks, Logic, Product engineering, Parallel processing, Electronics, 193nm lithography, Electronic design automation, Resolution enhancement technologies

Proceedings Article | 30 September 2009 Paper
Levi Barnes, Yong Li, David Wadkins, Steve Biederman, Alex Miloslavsky, Chris Cork
Proceedings Volume 7488, 74882L (2009) https://doi.org/10.1117/12.831396
KEYWORDS: Double patterning technology, Parallel processing, Photomasks, Lithography, Neodymium, Etching, Optical lithography, Lithium, Immersion lithography, Semiconductor manufacturing

SPIE Journal Paper | 1 July 2009
Kevin Lucas, Christopher Cork, Alexander Miloslavsky, Gerard Luk-Pat, Levi Barnes, John Hapli, John Lewellen, Gregory Rollins, Vincent Wiaux, Staf Verhaegen
JM3, Vol. 8, Issue 03, 033002, (July 2009) https://doi.org/10.1117/12.10.1117/1.3158061
KEYWORDS: Semiconducting wafers, Double patterning technology, Lithography, Optical lithography, Etching, Photomasks, Optical proximity correction, Metals, Standards development, Critical dimension metrology

Proceedings Article | 16 March 2009 Paper
Proceedings Volume 7274, 727413 (2009) https://doi.org/10.1117/12.815171
KEYWORDS: Atrial fibrillation, Optical proximity correction, Printing, 3D modeling, Photomasks, Process modeling, Data modeling, Model-based design, Solids, Optical lithography

Showing 5 of 17 publications
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