Dr. Levi D. Barnes
R&D Engineer at Synopsys Inc
SPIE Involvement:
Author
Publications (17)

Proceedings Article | 25 September 2010 Paper
Proc. SPIE. 7823, Photomask Technology 2010
KEYWORDS: Optical proximity correction, Photomasks, Calibration, Manufacturing, Semiconducting wafers, Tolerancing, Diffraction, Image processing, Critical dimension metrology, Immersion lithography

Proceedings Article | 4 March 2010 Paper
Proc. SPIE. 7640, Optical Microlithography XXIII
KEYWORDS: Double patterning technology, Optical lithography, Photomasks, Logic, Product engineering, Parallel processing, Electronics, 193nm lithography, Electronic design automation, Resolution enhancement technologies

Proceedings Article | 30 September 2009 Paper
Proc. SPIE. 7488, Photomask Technology 2009
KEYWORDS: Double patterning technology, Parallel processing, Photomasks, Lithography, Neodymium, Etching, Optical lithography, Lithium, Immersion lithography, Semiconductor manufacturing

SPIE Journal Paper | 1 July 2009
JM3 Vol. 8 Issue 03
KEYWORDS: Semiconducting wafers, Double patterning technology, Lithography, Optical lithography, Etching, Photomasks, Optical proximity correction, Metals, Standards development, Critical dimension metrology

Proceedings Article | 16 March 2009 Paper
Proc. SPIE. 7274, Optical Microlithography XXII
KEYWORDS: Optical proximity correction, Photomasks, Etching, Optical lithography, Double patterning technology, Semiconducting wafers, Critical dimension metrology, Model-based design, Printing, Resolution enhancement technologies

Showing 5 of 17 publications
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