Dr. Levi D. Barnes
R&D Engineer at Synopsys Inc
SPIE Involvement:
Author
Publications (17)

Proceedings Article | 25 September 2010
Proc. SPIE. 7823, Photomask Technology 2010
KEYWORDS: Diffraction, Calibration, Image processing, Manufacturing, Photomasks, Immersion lithography, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Tolerancing

Proceedings Article | 4 March 2010
Proc. SPIE. 7640, Optical Microlithography XXIII
KEYWORDS: Electronics, Logic, Optical lithography, Parallel processing, Photomasks, Double patterning technology, Product engineering, Electronic design automation, 193nm lithography, Resolution enhancement technologies

Proceedings Article | 30 September 2009
Proc. SPIE. 7488, Photomask Technology 2009
KEYWORDS: Lithography, Lithium, Optical lithography, Etching, Parallel processing, Photomasks, Semiconductor manufacturing, Double patterning technology, Immersion lithography, Neodymium

SPIE Journal Paper | 1 July 2009
JM3 Vol. 8 Issue 03
KEYWORDS: Semiconducting wafers, Double patterning technology, Lithography, Optical lithography, Etching, Photomasks, Optical proximity correction, Metals, Standards development, Critical dimension metrology

Proceedings Article | 16 March 2009
Proc. SPIE. 7274, Optical Microlithography XXII
KEYWORDS: Optical lithography, Etching, Printing, Photomasks, Double patterning technology, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Model-based design, Resolution enhancement technologies

Showing 5 of 17 publications
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