Li-Heng Chou
Development Engineer
SPIE Involvement:
Author
Publications (1)

PROCEEDINGS ARTICLE | March 16, 2009
Proc. SPIE. 7274, Optical Microlithography XXII
KEYWORDS: Lithography, Cadmium, Scanners, Printing, Photomasks, Optical proximity correction, Computer aided design, Semiconducting wafers, Resolution enhancement technologies, Phase shifts

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