Dr. Li Wang
Post-Doc at Paul Scherrer Institut
SPIE Involvement:
Author
Publications (6)

PROCEEDINGS ARTICLE | March 27, 2017
Proc. SPIE. 10146, Advances in Patterning Materials and Processes XXXIV
KEYWORDS: Lithography, Optical lithography, Phase contrast, Lithographic illumination, Etching, X-rays, Silicon, Chromium, Photoresist materials, Photomasks, Reactive ion etching, X-ray imaging, Semiconducting wafers

PROCEEDINGS ARTICLE | April 1, 2013
Proc. SPIE. 8679, Extreme Ultraviolet (EUV) Lithography IV
KEYWORDS: Lithography, Diffraction, Optical lithography, Photoresist materials, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Line edge roughness, Semiconducting wafers, Diffraction gratings

PROCEEDINGS ARTICLE | April 1, 2013
Proc. SPIE. 8679, Extreme Ultraviolet (EUV) Lithography IV
KEYWORDS: Lithography, Nanostructures, Optical lithography, Error analysis, Scanning electron microscopy, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Critical dimension metrology, Line edge roughness

PROCEEDINGS ARTICLE | May 1, 2012
Proc. SPIE. 8423, Metamaterials VII
KEYWORDS: Gold, Metamaterials, Near infrared, Metals, Glasses, Spectroscopy, Magnetism, Infrared spectroscopy, Terahertz radiation, Resonance enhancement

PROCEEDINGS ARTICLE | May 1, 2012
Proc. SPIE. 8424, Nanophotonics IV
KEYWORDS: Visible radiation, Deep ultraviolet, Polarization, Metals, Polarizers, Infrared radiation, Aluminum, Nanoimprint lithography, Nanophotonics, Nanofabrication

PROCEEDINGS ARTICLE | March 23, 2012
Proc. SPIE. 8322, Extreme Ultraviolet (EUV) Lithography III
KEYWORDS: Lithography, Electron beam lithography, Diffraction, Optical lithography, Scanning electron microscopy, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Line edge roughness, Diffraction gratings

Showing 5 of 6 publications
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Back to Top