Nanoscale grating structure can be utilized in many practical applications in optics, flat-panel displays, and
biosensors. Dynamic nanoinscribing (DNI) technique was newly developed to create large-area and truly continuous
nanograting patterns in a variety of metal or polymer materials with feature size down to sub-50 nm and at very high
speed. In this paper we investigate the nanopatterning of PC and SU-8 by DNI process and then take advantage of its
superior optical and thermal properties to explore its applications in nanooptics and nanofluidics. To carry out
nanoinscribing, silicon grating templates with different periods were first fabricated. The inscribing property of PC and
SU-8 under various pressures and temperatures was systematically studied, in which the experimental results were
compared with the simulation results described by a modified equation of Squeezed flow. Inscribed polymeric gratings
with period of 700nm were achieved and excellent uniformity can now be routinely replicated using this optimized
process. Using this technique, free-standing subwavelenth gratings based on SU-8 are successfully fabricated and their
performance are characterized. The inscribed polymeric gratings could also be sealed with another bare layer thermally
to serve as enclosed channels after oxygen plasma treatment. The fabricated nanofluidic channels were characterized
using spontaneous capillary filling with dyed water, demonstrating good quality of sealing.
UV curing nanoimprint is demonstrated for high aspect ratio gratings fabrication based on SU-8 for nanophotonics and
biochemical applications. The defects, which are caused by stress and friction between mold and resist and air bubbles
are key issues. To eliminate the defects, the process parameters, such as imprinting pressure, baking time and demolding
temperature, are optimized. SU-8 grating with 150nm in width and 1.5µm is presented with good uniformity in large area
using Si template fabricated by non-switching DRIE process. The process could find broader applications in the
manufacture of biochemical devices and nanophotonic structures.
We present results on the nanofabrication of high density patterns in SU-8 resist, based on nanoimprinting combined
with UV curing. The bilayer process using PMMA as sacrificial layer was developed to release the SU-8 layer to form
three dimensional structures. The SU-8 displays excellent imprint property and well defined patterns are achieved at at
low temperature, low pressure after demolding process. Using this technology, 300nm period SU-8 subwavelengh
gratings and nanochannels were fabricated on flat substrate with good fidelity. This sacrificial layer-assisted UV curing
imprint technology offers versatility and flexibility to stack polymer layers and sealed fluidic channels.
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