Dr. Lieve van Look
Researcher at imec
SPIE Involvement:
Publications (49)

Proceedings Article | 10 April 2024 Presentation + Paper
Proceedings Volume 12953, 129530J (2024) https://doi.org/10.1117/12.3010895
KEYWORDS: Critical dimension metrology, Reflectivity, Optical proximity correction, Light sources and illumination, Extreme ultraviolet, Design, Simulations, Scanners, Image processing, Modulation

Proceedings Article | 21 November 2023 Presentation + Paper
Proceedings Volume 12750, 1275005 (2023) https://doi.org/10.1117/12.2687549
KEYWORDS: Printing, 3D mask effects, Extreme ultraviolet, Simulations, Reticles, Photomask technology, Optical lithography, Metals, Lithography, Extreme ultraviolet lithography

Proceedings Article | 21 November 2023 Presentation + Paper
Proceedings Volume 12750, 1275002 (2023) https://doi.org/10.1117/12.2687703
KEYWORDS: Critical dimension metrology, Zoom lenses, Reticles, Metrology, Image quality, Extreme ultraviolet, Stochastic processes, Statistical analysis, Semiconducting wafers, Overlay metrology

Proceedings Article | 29 September 2023 Paper
Proceedings Volume 12915, 1291508 (2023) https://doi.org/10.1117/12.2685814
KEYWORDS: EUV optics, Line width roughness, Signal intensity, Diffraction, Nanoimprint lithography, Spatial frequencies, Critical dimension metrology, Stochastic processes, Source mask optimization, Image transmission

Proceedings Article | 28 April 2023 Presentation + Paper
Proceedings Volume 12494, 124940N (2023) https://doi.org/10.1117/12.2658714
KEYWORDS: Semiconducting wafers, Critical dimension metrology, Metrology, Light sources and illumination, Diffraction, Stochastic processes, Design and modelling, Spatial frequencies

Showing 5 of 49 publications
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