Dr. Lieve van Look
Researcher at IMEC
SPIE Involvement:
Author
Publications (30)

PROCEEDINGS ARTICLE | October 3, 2018
Proc. SPIE. 10809, International Conference on Extreme Ultraviolet Lithography 2018
KEYWORDS: Mirrors, Metrology, Scanners, Scanning electron microscopy, Photomasks, Extreme ultraviolet lithography, Critical dimension metrology, Semiconducting wafers, Stochastic processes

PROCEEDINGS ARTICLE | October 16, 2017
Proc. SPIE. 10450, International Conference on Extreme Ultraviolet Lithography 2017
KEYWORDS: Lithography, Optical lithography, Lithographic illumination, Scanners, Manufacturing, Extreme ultraviolet, Extreme ultraviolet lithography, High volume manufacturing, EUV optics

PROCEEDINGS ARTICLE | October 23, 2015
Proc. SPIE. 9635, Photomask Technology 2015
KEYWORDS: Diffraction, Mirrors, Inspection, Printing, Photomasks, Extreme ultraviolet, Nanoimprint lithography, Semiconducting wafers, Prototyping, 3D image processing

PROCEEDINGS ARTICLE | September 4, 2015
Proc. SPIE. 9661, 31st European Mask and Lithography Conference
KEYWORDS: Diffraction, Mirrors, Inspection, Printing, Photomasks, Extreme ultraviolet, Nanoimprint lithography, Semiconducting wafers, Prototyping, 3D image processing

PROCEEDINGS ARTICLE | July 9, 2015
Proc. SPIE. 9658, Photomask Japan 2015: Photomask and Next-Generation Lithography Mask Technology XXII
KEYWORDS: Diffraction, Mirrors, Reflectivity, Printing, Photomasks, Extreme ultraviolet, Nanoimprint lithography, Semiconducting wafers, Prototyping, 3D image processing

SPIE Journal Paper | July 2, 2015
JM3 Vol. 14 Issue 03
KEYWORDS: Etching, Scanning electron microscopy, Silicon, Inspection, Semiconducting wafers, Diffractive optical elements, Defect inspection, Thin film coatings, Directed self assembly

Showing 5 of 30 publications
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