Dr. Lieve van Look
Researcher at imec
SPIE Involvement:
Author
Publications (35)

Proceedings Article | 16 October 2019
Proc. SPIE. 11147, International Conference on Extreme Ultraviolet Lithography 2019
KEYWORDS: Scanning electron microscopy, Finite element methods, Extreme ultraviolet lithography, Critical dimension metrology, Optical correlators, Failure analysis, Stochastic processes

Proceedings Article | 26 September 2019
Proc. SPIE. 11147, International Conference on Extreme Ultraviolet Lithography 2019
KEYWORDS: Diffraction, Phase modulation, Metals, Phase shift keying, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Optical proximity correction, Nanoimprint lithography, Semiconducting wafers

Proceedings Article | 29 August 2019
Proc. SPIE. 11177, 35th European Mask and Lithography Conference (EMLC 2019)
KEYWORDS: Logic, Manufacturing, Inspection, Pellicles, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, High volume manufacturing, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 27 June 2019
Proc. SPIE. 11178, Photomask Japan 2019: XXVI Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Metrology, Photomasks, Extreme ultraviolet, Critical dimension metrology, Semiconducting wafers, Stochastic processes

Proceedings Article | 26 March 2019
Proc. SPIE. 10957, Extreme Ultraviolet (EUV) Lithography X
KEYWORDS: Optical lithography, Etching, Image processing, Image analysis, Scanning electron microscopy, Extreme ultraviolet, Extreme ultraviolet lithography, Critical dimension metrology, Semiconducting wafers, Failure analysis

Showing 5 of 35 publications
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