Dr. Lieve van Look
Researcher at imec
SPIE Involvement:
Author
Publications (37)

Proceedings Article | 23 February 2021 Presentation + Paper
Proc. SPIE. 11609, Extreme Ultraviolet (EUV) Lithography XII

Proceedings Article | 13 October 2020 Presentation + Paper
Proc. SPIE. 11517, Extreme Ultraviolet Lithography 2020
KEYWORDS: Ellipsometry, Metrology, Calibration, Scanners, Time metrology, Photomasks, Extreme ultraviolet lithography, Critical dimension metrology, Semiconducting wafers, EUV optics

Proceedings Article | 29 November 2019 Presentation + Paper
Proc. SPIE. 11147, International Conference on Extreme Ultraviolet Lithography 2019
KEYWORDS: Metrology, Cadmium, Defect detection, Etching, Inspection, Finite element methods, Critical dimension metrology, Optical correlators, Failure analysis, Stochastic processes

Proceedings Article | 26 September 2019 Presentation + Paper
Proc. SPIE. 11147, International Conference on Extreme Ultraviolet Lithography 2019
KEYWORDS: Diffraction, Phase modulation, Metals, Phase shift keying, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Optical proximity correction, Nanoimprint lithography, Semiconducting wafers

Proceedings Article | 29 August 2019 Paper
Proc. SPIE. 11177, 35th European Mask and Lithography Conference (EMLC 2019)
KEYWORDS: Logic, Manufacturing, Inspection, Pellicles, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, High volume manufacturing, Critical dimension metrology, Semiconducting wafers

Showing 5 of 37 publications
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