CONFERENCE PROCEEDINGS
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Dr. Ligang Deng
Products manager for Datacom and 3Ds at Oxford Instruments Plasma Technology Ltd
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Publications (4)
Proceedings Article | 14 October 2005 Paper
Low energy inductively coupled plasma etching of HgCdTe
Proceedings Volume 5964, 596408 (2005) https://doi.org/10.1117/12.625143
KEYWORDS: Etching, Mercury cadmium telluride, Plasma, Plasma etching, Argon, Anisotropic etching, Ions, Electrodes, Dry etching, Silica
Proceedings Article | 31 January 2005 Paper
Applications of ICP in optoelectronic device fabrication
Yi Gan, Jun Zhang, Shan Jiang, Xiaodong Huang, Ning Zhou, Ligang Deng
Proceedings Volume 5624, (2005) https://doi.org/10.1117/12.575729
KEYWORDS: Etching, Chlorine, Photomasks, Scanning electron microscopy, Optoelectronic devices, Dry etching, Ions, Vertical cavity surface emitting lasers, Reactive ion etching, Anisotropic etching
Proceedings Article | 12 May 2004 Paper
ICP etching of InP and related materials using photoresist as mask
Proceedings Volume 5280, (2004) https://doi.org/10.1117/12.520922
KEYWORDS: Etching, Photoresist materials, Ions, Electrodes, Semiconducting wafers, Photomasks, Plasma, Chemistry, Plasma systems, Dry etching
Proceedings Article | 12 May 2004 Paper
Angled stripe InGaAsP/InP SLED fabricated by low- damage inductively coupled plasma dry etching
Jun Zhang, Xiaodong Huang, Jin Chang, Yingjun Liu, Yi Gan, Linsong Li, Dingli Wang, Tao Liu, Shan Jiang, Ligang Deng
Proceedings Volume 5280, (2004) https://doi.org/10.1117/12.523504
KEYWORDS: Dry etching, Etching, Plasma, Reactive ion etching, Antireflective coatings, Chlorine, Metalorganic chemical vapor deposition, Ions, Plasma etching, Wet etching
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