Dr. Ligang Deng
Sr. Application Engineer at Oxford Instruments Plasma Technology Ltd
SPIE Involvement:
Author
Publications (4)

Proceedings Article | 14 October 2005 Paper
Proc. SPIE. 5964, Detectors and Associated Signal Processing II
KEYWORDS: Mercury cadmium telluride, Silica, Etching, Argon, Dry etching, Electrodes, Ions, Plasma etching, Anisotropic etching, Plasma

Proceedings Article | 31 January 2005 Paper
Proc. SPIE. 5624, Semiconductor and Organic Optoelectronic Materials and Devices
KEYWORDS: Etching, Dry etching, Ions, Scanning electron microscopy, Optoelectronic devices, Photomasks, Vertical cavity surface emitting lasers, Reactive ion etching, Chlorine, Anisotropic etching

Proceedings Article | 12 May 2004 Paper
Proc. SPIE. 5280, Materials, Active Devices, and Optical Amplifiers
KEYWORDS: Etching, Dry etching, Electrodes, Ions, Chemistry, Photoresist materials, Photomasks, Semiconducting wafers, Plasma systems, Plasma

Proceedings Article | 12 May 2004 Paper
Proc. SPIE. 5280, Materials, Active Devices, and Optical Amplifiers
KEYWORDS: Antireflective coatings, Etching, Dry etching, Ions, Wet etching, Plasma etching, Reactive ion etching, Chlorine, Metalorganic chemical vapor deposition, Plasma

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