Dr. Lin-Hung Shiu
Technical Manager at Taiwan Semiconductor Manufacturing Co Ltd
SPIE Involvement:
Publications (11)

Proceedings Article | 27 March 2007 Paper
Proceedings Volume 6520, 65204U (2007) https://doi.org/10.1117/12.712531
KEYWORDS: Semiconducting wafers, Scanners, Digital watermarking, Particles, Superposition, Microfluidics, Printing, Computer simulations, System identification, Immersion lithography

Proceedings Article | 26 March 2007 Paper
Proceedings Volume 6520, 652012 (2007) https://doi.org/10.1117/12.712527
KEYWORDS: Particles, Semiconducting wafers, Scanning electron microscopy, Digital watermarking, Printing, Defect inspection, Polymers, Immersion lithography, Neodymium, Wafer-level optics

SPIE Journal Paper | 1 January 2007 Open Access
JM3, Vol. 6, Issue 01, 010501, (January 2007) https://doi.org/10.1117/12.10.1117/1.2718941
KEYWORDS: Semiconducting wafers, Particles, Immersion lithography, Printing, Scanners, Double patterning technology, Liquids, Digital watermarking, Wafer testing, Reticles

Proceedings Article | 12 May 2005 Paper
Jeng-Horng Chen, Li-Jui Chen, Tun-Ying Fang, Tzung-Chi Fu, Lin-Hung Shiu, Yao-Te Huang, Norman Chen, Da-Chun Oweyang, Ming-Che Wu, Shih-Che Wang, John Lin, Chun-Kuang Chen, Wei-Ming Chen, Tsai-Sheng Gau, Burn Lin, Richard Moerman, Wendy Gehoel-van Ansem, Eddy van der Heijden, Fred de Jong, Dorothe Oorschot, Herman Boom, Martin Hoogendorp, Christian Wagner, Bert Koek
Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.602025
KEYWORDS: Semiconducting wafers, Scanners, Immersion lithography, Particles, Lithography, Overlay metrology, Prototyping, Microfluidics, Water, Finite element methods

Proceedings Article | 12 May 2005 Paper
Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.602032
KEYWORDS: Polarization, Photomasks, Diffraction, Optical lithography, Image acquisition, Semiconducting wafers, Projection systems, Immersion lithography, Computer simulations, Lenses

Showing 5 of 11 publications
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