Dr. Lin Lee Cheong
SPIE Involvement:
Publications (5)

Proceedings Article | 9 July 2015 Paper
Christina Turley, Jed Rankin, Louis Kindt, Mark Lawliss, Luke Bolton, Kevin Collins, Lin Cheong, Ravi Bonam, Richard Poro, Takeshi Isogawa, Eisuke Narita, Masayuki Kagawa
Proceedings Volume 9658, 965811 (2015) https://doi.org/10.1117/12.2197383
KEYWORDS: Photomasks, Extreme ultraviolet, Manufacturing, Resistance, Particles, Scanners, Extreme ultraviolet lithography, Optical inspection, Inspection, Reflectivity

Proceedings Article | 19 March 2015 Paper
Proceedings Volume 9422, 94221M (2015) https://doi.org/10.1117/12.2085913
KEYWORDS: Photomasks, Ruthenium, Particles, Extreme ultraviolet, Reflectivity, Surface roughness, Extreme ultraviolet lithography, Scanners, EUV optics, Pellicles

Proceedings Article | 13 March 2015 Paper
Proceedings Volume 9422, 94220T (2015) https://doi.org/10.1117/12.2086126
KEYWORDS: Semiconducting wafers, Etching, Line edge roughness, Line width roughness, Extreme ultraviolet lithography, Extreme ultraviolet, Critical dimension metrology, Scanning electron microscopy, Lithography, Scanners

Proceedings Article | 28 March 2014 Paper
A. Knoll, M. Zientek, L. Cheong, C. Rawlings, P. Paul, F. Holzner, J. Hedrick, D. Coady, R. Allen, U. Dürig
Proceedings Volume 9049, 90490B (2014) https://doi.org/10.1117/12.2046201
KEYWORDS: Optical lithography, Polymers, Lithography, Silicon, Scanning probe lithography, Image resolution, Molecules, Nanolithography, Scanning electron microscopy, Photomasks

Proceedings Article | 1 October 2013 Paper
Felix Holzner, Philip Paul, Michel Despont, Lin Lee Cheong, James Hedrick, Urs Dürig, Armin Knoll
Proceedings Volume 8886, 888605 (2013) https://doi.org/10.1117/12.2032318
KEYWORDS: Electron beam lithography, Optical lithography, Nanolithography, Silicon, Polymers, Scanning probe lithography, Reactive ion etching, Photomasks, Lithography, Scanning electron microscopy

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