Dr. Lin Lee Cheong
at ASML San Jose
SPIE Involvement:
Author
Publications (5)

PROCEEDINGS ARTICLE | July 9, 2015
Proc. SPIE. 9658, Photomask Japan 2015: Photomask and Next-Generation Lithography Mask Technology XXII
KEYWORDS: Scanners, Particles, Manufacturing, Resistance, Inspection, Reflectivity, Optical inspection, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography

PROCEEDINGS ARTICLE | March 19, 2015
Proc. SPIE. 9422, Extreme Ultraviolet (EUV) Lithography VI
KEYWORDS: Scanners, Particles, Reflectivity, Surface roughness, Pellicles, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Ruthenium, EUV optics

PROCEEDINGS ARTICLE | March 13, 2015
Proc. SPIE. 9422, Extreme Ultraviolet (EUV) Lithography VI
KEYWORDS: Lithography, Etching, Scanners, Scanning electron microscopy, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Critical dimension metrology, Line edge roughness, Semiconducting wafers

PROCEEDINGS ARTICLE | March 28, 2014
Proc. SPIE. 9049, Alternative Lithographic Technologies VI
KEYWORDS: Lithography, Optical lithography, Polymers, Molecules, Silicon, Image resolution, Scanning probe lithography, Scanning electron microscopy, Photomasks, Nanolithography

PROCEEDINGS ARTICLE | October 1, 2013
Proc. SPIE. 8886, 29th European Mask and Lithography Conference
KEYWORDS: Lithography, Electron beam lithography, Optical lithography, Polymers, Silicon, Scanning probe lithography, Scanning electron microscopy, Photomasks, Reactive ion etching, Nanolithography

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