Dr. Lin Hu
at GLOBALFOUNDRIES Inc
SPIE Involvement:
Author
Publications (4)

SPIE Journal Paper | 7 February 2017
JM3 Vol. 16 Issue 01
KEYWORDS: Directed self assembly, Resolution enhancement technologies, Lithography, Metals, Optical lithography, Photomasks, 3D modeling, Computational lithography, Optical proximity correction

Proceedings Article | 10 May 2016 Paper
Proc. SPIE. 9984, Photomask Japan 2016: XXIII Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Lithography, Logic, Opacity, Etching, Inspection, Chromium, Attenuators, Photomasks, SRAF, Phase shifts

Proceedings Article | 1 April 2016 Paper
Proc. SPIE. 9780, Optical Microlithography XXIX
KEYWORDS: Lithography, Printing, Transmittance, Photomasks, Optical proximity correction, SRAF, Critical dimension metrology, Semiconducting wafers, Resolution enhancement technologies, Phase shifts

Proceedings Article | 28 March 2016 Paper
Proc. SPIE. 9780, Optical Microlithography XXIX
KEYWORDS: Cadmium, Data modeling, Etching, Metals, Image processing, 3D modeling, Optical proximity correction, Reactive ion etching, Semiconducting wafers, Back end of line

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