Dr. Lin Wang
MTS at Spansion Inc
SPIE Involvement:
Author
Publications (3)

Proceedings Article | 17 October 2008
Proc. SPIE. 7122, Photomask Technology 2008
KEYWORDS: Reticles, Chromium, Photomasks, Optical proximity correction, SRAF, Critical dimension metrology, Line edge roughness, Photoresist processing, Semiconducting wafers, Resolution enhancement technologies

Proceedings Article | 12 June 2003
Proc. SPIE. 5039, Advances in Resist Technology and Processing XX
KEYWORDS: Etching, Polymers, Silicon, Resistance, Oxygen, Extreme ultraviolet, Boron, Extreme ultraviolet lithography, Line edge roughness, Reactive ion etching

Proceedings Article | 24 July 2002
Proc. SPIE. 4690, Advances in Resist Technology and Processing XIX
KEYWORDS: Etching, Chemical species, Polymers, Silicon, Resistance, Oxygen, Extreme ultraviolet, Boron, Extreme ultraviolet lithography, Reactive ion etching

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