Dr. Linda K. Sundberg
at IBM Research - Almaden
SPIE Involvement:
Author
Publications (26)

PROCEEDINGS ARTICLE | October 17, 2014
Proc. SPIE. 9235, Photomask Technology 2014
KEYWORDS: Logic, Switching, Opacity, Etching, Dry etching, Manufacturing, Image resolution, Scanning electron microscopy, SRAF, Critical dimension metrology

PROCEEDINGS ARTICLE | March 27, 2014
Proc. SPIE. 9051, Advances in Patterning Materials and Processes XXXI
KEYWORDS: Lithography, Lithium, Polymers, Image processing, Ions, Reflectivity, Photoresist processing, Semiconducting wafers, Standards development, Image quality standards

PROCEEDINGS ARTICLE | September 9, 2013
Proc. SPIE. 8880, Photomask Technology 2013
KEYWORDS: Optical microscopes, Switches, Switching, Ultraviolet radiation, Silicon, Lamps, Inspection, Chromium, Photomasks, Semiconducting wafers

PROCEEDINGS ARTICLE | March 29, 2013
Proc. SPIE. 8682, Advances in Resist Materials and Processing Technology XXX
KEYWORDS: Glasses, Scanning electron microscopy, Photoresist materials, Extreme ultraviolet, Line edge roughness, Analog electronics, Photomicroscopy, Photoresist processing, Semiconducting wafers, Resist chemistry

PROCEEDINGS ARTICLE | November 8, 2012
Proc. SPIE. 8522, Photomask Technology 2012
KEYWORDS: Electron beam lithography, Opacity, Manufacturing, Photomasks, SRAF, Critical dimension metrology, Line edge roughness, Photoresist processing, Binary data, Phase shifts

PROCEEDINGS ARTICLE | November 8, 2012
Proc. SPIE. 8522, Photomask Technology 2012
KEYWORDS: Electron beam lithography, Polymers, Ions, Image registration, Image quality, Photomasks, Line edge roughness, Neodymium, Photoresist processing, Semiconducting wafers

Showing 5 of 26 publications
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