Dr. Linda K. Sundberg Profile

Dr. Linda K. Sundberg

at IBM Research - Almaden

SPIE Involvement:

Author

Publications (26)

Proceedings Article | 17 October 2014 Paper

Paper

Characterization of a new polarity switching negative tone e-beam resist for 14nm and 10nm logic node mask fabrication and beyond

T. Faure, A. Zweber, L. Bozano, M. Sanchez, R. Sooriyakumaran, L. Sundberg, Y. Sakamoto, S. Nash, M. Kagawa, T. Isogawa, T. Senna, M. Tanabe, T. Komizo, I. Yoshida, K. Masunaga, S. Watanabe, Y. Kawai, J. Malenfant, R. Bowley

Proceedings Volume 9235, 92350P (2014) https://doi.org/10.1117/12.2069031

KEYWORDS: Etching, Opacity, Switching, SRAF, Dry etching, Critical dimension metrology, Logic, Scanning electron microscopy, Manufacturing, Image resolution

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Proceedings Article | 27 March 2014 Paper

Paper

ICE: Ionic contrast enhancement for organic solvent negative tone develop

Gregory Wallraff, Linda Sundberg, Luisa Bozano, Hoa Truong, Martha Sanchez, Dario Goldfarb, Karen Petrillo, William Hinsberg

Proceedings Volume 9051, 90510S (2014) https://doi.org/10.1117/12.2046762

KEYWORDS: Image processing, Ions, Photoresist processing, Semiconducting wafers, Polymers, Lithium, Standards development, Lithography, Image quality standards, Reflectivity

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Proceedings Article | 9 September 2013 Paper

Paper

Defects on high-resolution negative-tone resist: "The revenge of the blobs"

M. Sanchez, L. Sundberg, L. Bozano, R. Sooriyakumaran, D. Sanders, T. Senna, M. Tanabe, T. Komizo, I. Yoshida, A. Zweber

Proceedings Volume 8880, 88800V (2013) https://doi.org/10.1117/12.2028753

KEYWORDS: Photomasks, Semiconducting wafers, Inspection, Switching, Chromium, Switches, Silicon, Ultraviolet radiation, Lamps, Optical microscopes

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Proceedings Article | 29 March 2013 Paper

Paper

Monitoring the evolution of line edge roughness during resist development using an analog of quenched flow kinetics

L. Sundberg, G. Wallraff, H. Truong, W. Hinsberg, L. Bozano, K. Petrillo, M. Sanchez

Proceedings Volume 8682, 868218 (2013) https://doi.org/10.1117/12.2010966

KEYWORDS: Line edge roughness, Scanning electron microscopy, Analog electronics, Glasses, Extreme ultraviolet, Photoresist processing, Resist chemistry, Photoresist materials, Semiconducting wafers, Photomicroscopy

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Proceedings Article | 8 November 2012 Paper

Paper

Conductive layer for charge dissipation during electron-beam exposures

Ratnam Sooriyakumaran, Elizabeth Lofano, Takayuki Nagasawa, Martha Sanchez, Charles Rettner, Yoshio Kawai, Shinpei Kondo, Satoshi Watanabe, Jun Kotani, Masayuki Kagawa, Thomas Faure, Tasuku Senna, Linda Sundberg, Luisa Bozano

Proceedings Volume 8522, 85220O (2012) https://doi.org/10.1117/12.977181

KEYWORDS: Image quality, Photomasks, Semiconducting wafers, Polymers, Electron beam lithography, Line edge roughness, Image registration, Photoresist processing, Neodymium, Ions

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Proceedings Article | 8 November 2012 Paper

Paper

Study and comparison of negative tone resists for fabrication of bright field masks for 14nm node

Yuki Fujita, Amy Zweber, Takahiro Kaneko, Tasuku Senna, Martha Sanchez, Anne McGuire, Ratnam Sooriyakumaran, Luisa Bozano, Yoshiyuki Negishi, Masahito Tanabe, Tom Faure, Linda Sundberg

Proceedings Volume 8522, 85220S (2012) https://doi.org/10.1117/12.976878

KEYWORDS: Photomasks, Line edge roughness, SRAF, Manufacturing, Opacity, Critical dimension metrology, Phase shifts, Binary data, Photoresist processing, Electron beam lithography

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Proceedings Article | 20 March 2012 Paper

Paper

Conductive layer for charge dissipation during electron-beam exposures

Luisa Bozano, Linda Sundberg, Yoshio Kawai, Satoshi Watanabe, Takayuki Nagasawa, Martha Sanchez, Charles Rettner, Ratnam Sooriyakumaran, Nagarajan Palavesam, Gustavo Gandara Montano, Elizabeth Lofano

Proceedings Volume 8325, 83250X (2012) https://doi.org/10.1117/12.916756

KEYWORDS: Image quality, Polymers, Semiconducting wafers, Gold, Electron beams, Resistance, Lithography, Chemically amplified resists, Thin film coatings, Neodymium

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Proceedings Article | 16 April 2011 Paper

Paper

Visualization of the develop process

Sally Swanson, Charles Rettner, Phillip Brock, Alexander Friz, William Hinsberg, Gregory Wallraff, Blake Davis, Linda Sundberg

Proceedings Volume 7972, 79720I (2011) https://doi.org/10.1117/12.882185

KEYWORDS: Polymers, Semiconducting wafers, Visualization, Video, Critical dimension metrology, Luminescence, Optical tracking, Video processing, Photoresist processing, Interfaces

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Proceedings Article | 16 April 2011 Paper

Paper

Hexafluoroalcohol (HFA) containing molecular resist materials for high-resolution lithographic applications

Masaki Fujiwara, Anuja De Silva, Linda Sundberg, Luisa Bozano, William Hinsberg, Ratnam Sooriyakumaran, Greg Breyta

Proceedings Volume 7972, 79721Z (2011) https://doi.org/10.1117/12.881735

KEYWORDS: Magnesium, Lithography, Glasses, Silicon, Extreme ultraviolet lithography, Electron beam lithography, Molecules, Extreme ultraviolet, Polymers, Thin films

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Proceedings Article | 25 September 2010 Paper

Paper

Two complementary methods to characterize long range proximity effects due to develop loading

William Hinsberg, Amy Zweber, Alexander Friz, Robert Lovchik, Linda Sundberg, Emmanuel Delamarche, Greg Wallraff, Blake Davis, Toru Komizo, Tasuku Senna

Proceedings Volume 7823, 78230G (2010) https://doi.org/10.1117/12.864336

KEYWORDS: Critical dimension metrology, Standards development, Electron beam lithography, Lithography, Semiconducting wafers, Deep ultraviolet, Photomasks, Optical lithography, Photoresist processing, Photography

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Proceedings Article | 31 March 2010 Paper

Paper

High contact angle fluorosulfonamide-based materials for immersion lithography

Masaki Fujiwara, Daniel Sanders, Yoshiharu Terui, Manabu Yasumoto, Linda Sundberg

Proceedings Volume 7639, 763925 (2010) https://doi.org/10.1117/12.847257

KEYWORDS: Photoresist materials, Polymers, Lithography, Immersion lithography, Semiconducting wafers, Glasses, Photoresist developing, Roads, Water, Interfaces

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Proceedings Article | 30 March 2010 Paper

Paper

A method to characterize pattern density effects: chemical flare and develop loading

William Hinsberg, Alexander Friz, Gregory Wallraff, Amy Zweber, Linda Sundberg, Robert Lovchik, Emmanuel Delamarche, Zdenek Benes

Proceedings Volume 7639, 76392S (2010) https://doi.org/10.1117/12.849145

KEYWORDS: Semiconducting wafers, Critical dimension metrology, Liquids, Silicon, Ions, Reactive ion etching, Wafer-level optics, Plasma, Photoresist developing, Optical lithography

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Proceedings Article | 1 April 2009 Paper

Paper

Hybrid resist systems based on α-substituted acrylate copolymers

Linda Sundberg, Kazuhiro Yamanaka, Elizabeth Lofano, Masaki Fujiwara, Yoshiharu Terui, Hiroshi Ito, Luisa Bozano

Proceedings Volume 7273, 72733H (2009) https://doi.org/10.1117/12.813352

KEYWORDS: Polymers, Polymethylmethacrylate, Line width roughness, Line edge roughness, Polymerization, Crystals, Semiconducting wafers, Quartz, Silicon, Manufacturing

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Classical electron-beam resists such as poly(methyl methacrylate) (PMMA) and Nippon Zeon's ZEP function as high resolution and low roughness positive resists on the basis of radiation induced main chain scission to reduce the molecular weight while chemical amplification resists utilized in device manufacturing function on the basis of acidcatalyzed deprotection to change the polarity. In an attempt to increase the resolution and reduce the line roughness of chemical amplification resists, we prepared copolymers that undergo radiation induced main chain scission and acidcatalyzed deprotection. In another word, we wanted to increase the sensitivity of the PMMA resist by incorporating the acid-catalyzed deprotection mechanism in polymers that undergo main chain scission, maintaining the high resolution and low roughness of PMMA. To synthesize such hybrid resist polymers, we selected α-substituted acrylates and α- substituted styrenes. The former included methyl methacrylate (MMA), t-butyl methacrylate (TBMA), methyl α- fluoroacrylate (MFA), t-butyl α-fluoroacrylate (TBFA), and t-butyl α-trifluoromethylacrylate (TBTFMA) and the latter α-methylstyrene (αMEST), α-methyleneindane (αMEIN), and α-methylenetetralin (αMETL). The α-substituted tbutyl acrylic esters were copolymerized with the methyl esters and also with α-substituted styrenic monomers using 2, 2'-azobis(isobutyronitrile) (AIBN). Hybrid resists were formulated by adding a photochemical acid generator and a base quencher to the copolymers and developers were selected by studying the dissolution behavior of unexposed and 254 nm exposed resist films using a quartz crystal microbalance (QCM). In addition to the difference in the imaging mechanism, PMMA and ZEP differ from the chemical amplification resists in developers; organic solvent vs. aqueous base. We were interested in looking also into the influence of the developer on the lithographic performance. Contrast curves were generated by exposing the resist films to 100 keV electron beams and by changing the postexposure bake temperature (PEB) on a thermal gradient hot plate (TGP). The resists were imaged on our Leica 100 keV electron-beam system and line roughness was measured.

Proceedings Article | 4 April 2008 Paper

Paper

Self-segregating materials for immersion lithography

Hiroshi Ito, Linda Sundberg, Dario Goldfarb, Robert Allen, Daniel Sanders, Gregory McIntyre, Phillip Brock, Hoa Truong

Proceedings Volume 6923, 692309 (2008) https://doi.org/10.1117/12.772937

KEYWORDS: Polymers, Water, Immersion lithography, Photoresist materials, Lithography, Natural surfaces, Interfaces, Semiconducting wafers, Optical properties, Fluorine

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Proceedings Article | 21 March 2008 Paper

Paper

Integration of polymer self-assembly for lithographic application

Linda Sundberg, Joy Cheng, Ho-Cheol Kim, Daniel Sanders

Proceedings Volume 6921, 692127 (2008) https://doi.org/10.1117/12.773247

KEYWORDS: Polymers, Lithography, Optical lithography, Thin films, Polymethylmethacrylate, Process control, Nanostructures, Platinum, Gold, Directed self assembly

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Proceedings Article | 9 April 2007 Paper

Paper

Building an immersion topcoat from the ground up: materials perspective

Linda Sundberg, M. Slezak, G. Dabbagh, Irene Popova, Matthew Colburn, Mahmoud Khojasteh, P. Rao Varanasi, C. Robinson, D. Corliss, Margaret Lawson, K. Petrillo

Proceedings Volume 6519, 651907 (2007) https://doi.org/10.1117/12.712095

KEYWORDS: Thin film coatings, Polymers, Polymer thin films, Lithography, Immersion lithography, Solids, Photoresist processing, Scanners, Scanning electron microscopy, Statistical analysis

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Proceedings Article | 2 April 2007 Paper

Paper

Contact angles and structure/surface property relationships of immersion materials

Phillip Brock, Daniel Sanders, Ratnam Sooriyakumaran, Linda Sundberg, Robert Allen

Proceedings Volume 6519, 65191Q (2007) https://doi.org/10.1117/12.712632

KEYWORDS: Fluorine, Polymers, Immersion lithography, Surface properties, Semiconducting wafers, Polymer thin films, Lithography, Carbon, Silicon, Quartz

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Proceedings Article | 2 April 2007 Paper

Paper

Fluoro-alcohol materials with tailored interfacial properties for immersion lithography

Richard DiPietro, Daniel Sanders, Robert Allen, Linda Sundberg, Ratnam Sooriyakumaran, Dolores Miller, Phillip Brock, Hoa Truong, Margaret Lawson

Proceedings Volume 6519, 651904 (2007) https://doi.org/10.1117/12.712768

KEYWORDS: Fluorine, Polymers, Immersion lithography, Lithography, Interfaces, Semiconducting wafers, Carbon, Water, Surface properties, Hydrogen

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Proceedings Article | 29 March 2006 Paper

Paper

The effect of photoresist/topcoat properties on defect formation in immersion lithography

G. Wallraff, D. Gil, G. Breyta, L. Sundberg, C. Larson, K. Petrillo, W. Pierson, D. Miller

Proceedings Volume 6153, 61531M (2006) https://doi.org/10.1117/12.657179

KEYWORDS: Semiconducting wafers, Immersion lithography, Particles, Silicon, Rhodamine, Photoresist materials, Digital watermarking, Video, Image processing, Solids

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Proceedings Article | 4 May 2005 Paper

Paper

193nm single layer photoresists: defeating tradeoffs with a new class of fluoropolymers

Wenjie Li, Tsutomu Shimokawa, Pushkara Varanasi, Ratnam Sooriyakumaran, Mark Slezak, M. Lawson, Ranee Kwong, Linda Sundberg, Takashi Chiba, Kaushal Patel, Kuang-Jung Chen, Robert Allen, P. Brock, Mahmoud Khojasteh, Gary Dabbagh, Z. Liu, Yukio Nishimura

Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.599700

KEYWORDS: Polymers, 193nm lithography, Lithography, Etching, Photoresist materials, Fluorine, Immersion lithography, Modulation, Photomasks, Reactive ion etching

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Proceedings Article | 4 May 2005 Paper

Paper

Evaluation of functional properties of imaging materials for water immersion lithography

William Hinsberg, F. Houle, G. Wallraff, C. Larson, Hoa Truong, Blake Davis, Robert Allen, Linda Sundberg, J. Hoffnagle

Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.600560

KEYWORDS: Lithography, Water, Polymers, Liquids, Contamination, Reflectivity, Interferometry, Immersion lithography, Semiconducting wafers, Chemical analysis

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Proceedings Article | 4 May 2005 Paper

Paper

Studies of acid diffusion in low Ea chemically amplified photoresists

C. Larson, F. Houle, Karen Petrillo, M. Sanchez, J. Bucchignano, G. Wallraff, C. Rettner, J. Hoffnagle, William Hinsberg, Dario Goldfarb, Wu-Song Huang, Linda Sundberg, B. Davis, K. Temple, D. Medeiros

Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.601759

KEYWORDS: Diffusion, Absorption, Photoresist materials, Polymers, Humidity, Lithography, Extreme ultraviolet lithography, Image resolution, Infrared imaging, Photoresist processing

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Proceedings Article | 4 May 2005 Paper

Paper

Molecular resists based on polyhedral oligomeric silsesquioxanes (POSS)

Mark Morris, Dirk Pfeiffer, Hiroshi Ito, Hoa Truong, Wu-Song Huang, Ratnam Sooriyakumaran, Robert Allen, Linda Sundberg, Bill Hinsberg, Sean Burns, Dario Goldfarb

Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.600615

KEYWORDS: Silicon, Line edge roughness, Polymers, Glasses, Standards development, Diffusion, Lithography, Spectroscopy, Macromolecules, Chemically amplified resists

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Proceedings Article | 14 May 2004 Paper

Paper

Liquid immersion lithography: evaluation of resist issues

Gregory Wallraff, Carl Larson, Willard Conley, Dolores Miller, David Medeiros, Linda Sundberg, William Hinsberg, Simone Raoux, Ralph Dammel, Charles Rettner, Frances Houle, John Hoffnagle, Vaughn Deline, Martha Sanchez, Blake Davis

Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.536576

KEYWORDS: Liquids, Polymers, Diffusion, Lithography, Immersion lithography, Polymer thin films, Imaging systems, Neodymium, Semiconducting wafers, Absorption

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Proceedings Article | 14 May 2004 Paper

Paper

Optimized acid release underlayers for 157-nm lithography

Carl Larson, L. Johnson, Gregory Wallraff, Linda Sundberg, Phillip Brock

Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.538686

KEYWORDS: Absorbance, Polymers, Lithography, Interfaces, Imaging systems, Diffusion, Antireflective coatings, Thin films, Transparency, Extreme ultraviolet

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Proceedings Article | 14 May 2004 Paper

Paper

193-nm negative resist based on acid-catalyzed elimination of polar molecules

Kaushal Patel, Gregory Breyta, Phillip Brock, Blake Davis, Eric Connor, Richard DiPietro, Linda Sundberg, Pushkara Rao Varanasi, Ratnam Sooriyakumaran, Carl Larson, Robert Allen, Thomas Wallow

Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.536432

KEYWORDS: Polymers, Molecules, Switches, Standards development, Distortion, Photoresist materials, Lithography, Spectroscopy, Photomasks, Photoresist developing

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Showing 5 of 26 publications

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