Dr. Ling Chieh Lin
at United Microelectronics Corp
SPIE Involvement:
Author
Publications (5)

PROCEEDINGS ARTICLE | March 15, 2006
Proc. SPIE. 6155, Data Analysis and Modeling for Process Control III
KEYWORDS: Lithography, Lithographic illumination, Data modeling, Calibration, Scanners, Projection systems, Photomasks, Optical proximity correction, Critical dimension metrology, Optical calibration

PROCEEDINGS ARTICLE | May 10, 2005
Proc. SPIE. 5752, Metrology, Inspection, and Process Control for Microlithography XIX
KEYWORDS: Optical design, Metrology, Metals, Image processing, Tungsten, Manufacturing, Optical alignment, Semiconducting wafers, Overlay metrology, Chemical mechanical planarization

PROCEEDINGS ARTICLE | May 4, 2005
Proc. SPIE. 5753, Advances in Resist Technology and Processing XXII
KEYWORDS: Optical lithography, Image processing, Coating, Line width roughness, Chemical reactions, Critical dimension metrology, Line edge roughness, Photoresist processing, Semiconducting wafers, Resolution enhancement technologies

PROCEEDINGS ARTICLE | May 4, 2005
Proc. SPIE. 5753, Advances in Resist Technology and Processing XXII
KEYWORDS: Lithography, Optical lithography, Etching, Copper, Coating, Scanning electron microscopy, Photoresist materials, Critical dimension metrology, Semiconducting wafers, Optics manufacturing

PROCEEDINGS ARTICLE | May 12, 2004
Proc. SPIE. 5754, Optical Microlithography XVIII
KEYWORDS: Lithography, Cadmium, Manufacturing, Photomasks, Optical proximity correction, SRAF, Critical dimension metrology, Semiconducting wafers, Resolution enhancement technologies, Fiber optic illuminators

SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Back to Top