Dr. Ling Chieh Lin
at United Microelectronics Corp
SPIE Involvement:
Publications (5)

Proceedings Article | 15 March 2006 Paper
Te Hung Wu, C. L. Lin, Ming Jui Chen, Zen Hsiang Tsai, Chen Yu Ao, H. C. Thuang, Jian Shin Liou, Chuen Huei Yang, Ling Chieh Lin
Proceedings Volume 6155, 61550M (2006) https://doi.org/10.1117/12.657900
KEYWORDS: Optical proximity correction, Data modeling, Scanners, Lithography, Photomasks, Projection systems, Optical calibration, Calibration, Lithographic illumination, Critical dimension metrology

Proceedings Article | 12 May 2005 Paper
I. Huang, Ling Lin, Chin Lin
Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.599559
KEYWORDS: Photomasks, Optical proximity correction, Fiber optic illuminators, Resolution enhancement technologies, SRAF, Semiconducting wafers, Cadmium, Lithography, Critical dimension metrology, Manufacturing

Proceedings Article | 10 May 2005 Paper
Proceedings Volume 5752, (2005) https://doi.org/10.1117/12.598424
KEYWORDS: Overlay metrology, Chemical mechanical planarization, Metrology, Semiconducting wafers, Tungsten, Optical alignment, Manufacturing, Metals, Image processing, Optical design

Proceedings Article | 4 May 2005 Paper
Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.600408
KEYWORDS: Coating, Etching, Semiconducting wafers, Lithography, Photoresist materials, Optics manufacturing, Optical lithography, Copper, Scanning electron microscopy, Critical dimension metrology

Proceedings Article | 4 May 2005 Paper
Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.598447
KEYWORDS: Line width roughness, Chemical reactions, Photoresist processing, Line edge roughness, Critical dimension metrology, Image processing, Resolution enhancement technologies, Semiconducting wafers, Optical lithography, Coating

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