Ling-Chieh Lin
at Mentor Graphics Taiwan Ltd
SPIE Involvement:
Author
Publications (4)

PROCEEDINGS ARTICLE | June 12, 2018
Proc. SPIE. 10807, Photomask Japan 2018: XXV Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Visualization, Databases, Microelectronics, System identification, Design for manufacturing, Photomasks, Lutetium, Semiconducting wafers, Rule based systems, Design for manufacturability

PROCEEDINGS ARTICLE | July 13, 2017
Proc. SPIE. 10454, Photomask Japan 2017: XXIV Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Reticles, Databases

PROCEEDINGS ARTICLE | May 10, 2016
Proc. SPIE. 9984, Photomask Japan 2016: XXIII Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Reticles, Radon, Visualization, Databases, Etching, Photomasks, Acquisition tracking and pointing, Data conversion, Neodymium, Semiconducting wafers

PROCEEDINGS ARTICLE | December 4, 2008
Proc. SPIE. 7140, Lithography Asia 2008
KEYWORDS: Lithography, Manufacturing, Printing, Optical proximity correction, SRAF, Critical dimension metrology, Optimization (mathematics), Semiconducting wafers, Model-based design, Resolution enhancement technologies

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