Mr. Ling Li
at Institute of Microelectronics
SPIE Involvement:
Author
Publications (1)

PROCEEDINGS ARTICLE | January 27, 2005
Proc. SPIE. 5645, Advanced Microlithography Technologies
KEYWORDS: Lithography, Electron beam lithography, Optical lithography, Microelectronics, Photomasks, Optical proximity correction, Mask making, Computer aided design, 193nm lithography, Resolution enhancement technologies

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