Dr. Linyong Pang
Chief Executive Officer and EVP at D2S Inc
SPIE Involvement:
Editorial Board Member: Journal of Micro/Nanopatterning, Materials, and Metrology | Author
Area of Expertise:
Inverse lithography technology (ILT) , OPC , Semiconductor , Computational lithography , Computational inspection , EDA
Profile Summary

Dr. Linyong (Leo) Pang is currently the Chief Product Office and Executive Vice President at D2S, Inc.. Prior to D2S, Dr. Pang was the GM and sole Sr. Vice President of Luminescent Technologies. Dr. Pang joined the Luminescent executive team from its beginning in 2004 and played leadership roles with products, technologies, marketing, and customers until its final acquisition by KLA-Tencor. He is most widely known as the person that introduced curvilinear inverse lithography technology (ILT, which acronym he coined) to the lithography and photomask world. He founded and was the GM of the Computational Lithography division of Luminescent (acquired by Synopsys in 2012) as well as the Computational Metrology and Inspection division (acquired by KLA-Tencor in March 2014). His pioneering work in EDA and Semiconductor started back 2000, and as the inventor of the Numerical Technologies i-Virtual Stepper System, which was given the “2001 Editors' Choice Best Product Award” by Semiconductor International. Prior to joining Luminescent, Dr. Pang held several product development and marketing management positions at Numerical Technologies and Synopsys (after acquisition), and a research scientist position at Acuson. To date, Dr. Pang has 38 issued patents, 27 pending patents, and 85 publications. Dr. Pang received his Ph.D. in Mechanical Engineering and an additional M.S. in Computer Science from Stanford University.
Publications (80)

Proceedings Article | 10 April 2024 Presentation + Paper
Proceedings Volume 12954, 1295416 (2024) https://doi.org/10.1117/12.3014640
KEYWORDS: Optical proximity correction, Scanners, Lithography, Chip manufacturing, Photomasks, Design, Scanning electron microscopy

SPIE Journal Paper | 6 February 2024
JM3, Vol. 23, Issue 01, 011207, (February 2024) https://doi.org/10.1117/12.10.1117/1.JMM.23.1.011207
KEYWORDS: Vestigial sideband modulation, Semiconducting wafers, Optical proximity correction, SRAF, Critical dimension metrology, Lithography, Printing, Design, Scanning electron microscopy, Photomask technology

SPIE Journal Paper | 15 December 2021 Open Access
JM3, Vol. 20, Issue 04, 041201, (December 2021) https://doi.org/10.1117/12.10.1117/1.JMM.20.4.041201
KEYWORDS: Photomasks, Scanning electron microscopy, 3D modeling, Extreme ultraviolet, Lithography, Evolutionary algorithms, Optical proximity correction, Neural networks, Image classification, Defect detection

SPIE Journal Paper | 17 November 2021 Open Access
JM3, Vol. 20, Issue 04, 041405, (November 2021) https://doi.org/10.1117/12.10.1117/1.JMM.20.4.041405
KEYWORDS: Photomasks, Semiconducting wafers, Optical proximity correction, Lithography, Vestigial sideband modulation, Semiconductor manufacturing, Manufacturing, Extreme ultraviolet, Physics, Semiconductors

SPIE Journal Paper | 31 August 2021 Open Access
JM3, Vol. 20, Issue 03, 030901, (August 2021) https://doi.org/10.1117/12.10.1117/1.JMM.20.3.030901
KEYWORDS: Photomasks, Lithography, Vestigial sideband modulation, Semiconducting wafers, Optical proximity correction, SRAF, Extreme ultraviolet, Manufacturing, Optimization (mathematics), 3D modeling

Showing 5 of 80 publications
Conference Committee Involvement (20)
CSTIC 2022
14 June 2022 |
CSTIC 2021
14 March 2021 |
CSTIC 2020
26 June 2020 |
Lithography Workshop
3 November 2019 |
CSTIC 2019
18 March 2019 |
Showing 5 of 20 Conference Committees
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