Dr. Linyong Pang
Chief Executive Officer and EVP at D2S Inc
SPIE Involvement:
Conference Program Committee | Author
Websites:
Publications (64)

Proceedings Article | 31 October 2017
Proc. SPIE. 10451, Photomask Technology 2017
KEYWORDS: Point spread functions, Data modeling, Scattering, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Raster graphics, Electro optical modeling, Process modeling, Vestigial sideband modulation

Proceedings Article | 13 July 2017
Proc. SPIE. 10454, Photomask Japan 2017: XXIV Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Lithography, Modulation, Etching, Image processing, Photomasks, Computational lithography, Optical proximity correction, Convolution, Mask making, Model-based design, Process modeling

Proceedings Article | 23 October 2015
Proc. SPIE. 9635, Photomask Technology 2015
KEYWORDS: Lithography, 3D acquisition, Defect detection, Manufacturing, Image analysis, Scanning electron microscopy, 3D metrology, Bridges, Photomasks, Extreme ultraviolet, Critical dimension metrology, Semiconducting wafers, Standards development, 193nm lithography, Defect inspection

Proceedings Article | 9 July 2015
Proc. SPIE. 9658, Photomask Japan 2015: Photomask and Next-Generation Lithography Mask Technology XXII
KEYWORDS: Signal to noise ratio, Lithography, Optical lithography, Scanning electron microscopy, Photomasks, Source mask optimization, Critical dimension metrology, Semiconducting wafers, 193nm lithography, Defect inspection

Proceedings Article | 8 October 2014
Proc. SPIE. 9235, Photomask Technology 2014
KEYWORDS: Lithography, Data modeling, Error analysis, Manufacturing, Photomasks, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Model-based design, Vestigial sideband modulation

Proceedings Article | 8 October 2014
Proc. SPIE. 9235, Photomask Technology 2014
KEYWORDS: Modulation, Backscatter, Electrons, Manufacturing, Monte Carlo methods, Photomasks, Optical proximity correction, Convolution, Critical dimension metrology, Vestigial sideband modulation

Showing 5 of 64 publications
Conference Committee Involvement (4)
Photomask Technology 2015
29 September 2015 | Monterey, California, United States
Photomask Technology 2014
16 September 2014 | Monterey, California, United States
SPIE Photomask Technology
10 September 2013 | Monterey, California, United States
Photomask Technology
11 September 2012 | Monterey, California, United States
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