Lior Akerman
at Applied Materials Inc
SPIE Involvement:
Author
Publications (2)

SPIE Journal Paper | October 1, 2006
JM3 Vol. 5 Issue 04
KEYWORDS: Semiconducting wafers, Photoresist materials, Scanning electron microscopy, Critical dimension metrology, Chemistry, Electron microscopes, Lead, Molecules, Process control, Printing

PROCEEDINGS ARTICLE | May 10, 2005
Proc. SPIE. 5752, Metrology, Inspection, and Process Control for Microlithography XIX
KEYWORDS: Electron beam lithography, Coating, Chemistry, Electron microscopes, Scanning electron microscopy, Photoresist materials, Critical dimension metrology, Line edge roughness, Semiconducting wafers, Lead

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