Lior Shoval
Electrical Engineer at Applied Materials Ltd
SPIE Involvement:
Author
Publications (12)

PROCEEDINGS ARTICLE | June 28, 2013
Proc. SPIE. 8701, Photomask and Next-Generation Lithography Mask Technology XX
KEYWORDS: Wafer-level optics, Signal to noise ratio, Defect detection, Deep ultraviolet, Inspection, Optical inspection, Printing, Photomasks, Geometrical optics, Semiconducting wafers

PROCEEDINGS ARTICLE | March 23, 2012
Proc. SPIE. 8322, Extreme Ultraviolet (EUV) Lithography III
KEYWORDS: Mathematical modeling, Data modeling, Databases, Image processing, Inspection, Photomasks, Extreme ultraviolet, Semiconducting wafers, Prototyping, Solid modeling

PROCEEDINGS ARTICLE | January 24, 2012
Proc. SPIE. 8166, Photomask Technology 2011
KEYWORDS: Multilayers, Contamination, Scattering, Inspection, Reflectivity, Scanning electron microscopy, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers

PROCEEDINGS ARTICLE | January 24, 2012
Proc. SPIE. 8166, Photomask Technology 2011
KEYWORDS: Multilayers, Contamination, Scattering, Inspection, Reflectivity, Scanning electron microscopy, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers

PROCEEDINGS ARTICLE | November 29, 2010
Proc. SPIE. 7823, Photomask Technology 2010
KEYWORDS: Reticles, Defect detection, Deep ultraviolet, Inspection, Printing, Wafer inspection, Photomasks, Extreme ultraviolet, Bismuth, Semiconducting wafers

PROCEEDINGS ARTICLE | May 28, 2010
Proc. SPIE. 7748, Photomask and Next-Generation Lithography Mask Technology XVII
KEYWORDS: Defect detection, Deep ultraviolet, Scanners, Inspection, Wafer inspection, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, Resolution enhancement technologies

Showing 5 of 12 publications
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