Lior Shoval
Electrical Engineer at Applied Materials Ltd
SPIE Involvement:
Author
Publications (12)

Proceedings Article | 28 June 2013
Proc. SPIE. 8701, Photomask and Next-Generation Lithography Mask Technology XX
KEYWORDS: Photomasks, Inspection, Printing, Deep ultraviolet, Signal to noise ratio, Defect detection, Semiconducting wafers, Optical inspection, Wafer-level optics, Geometrical optics

Proceedings Article | 23 March 2012
Proc. SPIE. 8322, Extreme Ultraviolet (EUV) Lithography III
KEYWORDS: Inspection, Photomasks, Extreme ultraviolet, Databases, Data modeling, Image processing, Prototyping, Solid modeling, Mathematical modeling, Semiconducting wafers

Proceedings Article | 24 January 2012
Proc. SPIE. 8166, Photomask Technology 2011
KEYWORDS: Inspection, Reflectivity, Extreme ultraviolet, Photomasks, Scanning electron microscopy, Contamination, Scattering, Extreme ultraviolet lithography, Semiconducting wafers, Multilayers

Proceedings Article | 24 January 2012
Proc. SPIE. 8166, Photomask Technology 2011
KEYWORDS: Inspection, Reflectivity, Extreme ultraviolet, Photomasks, Scanning electron microscopy, Contamination, Scattering, Extreme ultraviolet lithography, Semiconducting wafers, Multilayers

Proceedings Article | 29 November 2010
Proc. SPIE. 7823, Photomask Technology 2010
KEYWORDS: Photomasks, Inspection, Semiconducting wafers, Wafer inspection, Defect detection, Extreme ultraviolet, Printing, Deep ultraviolet, Reticles, Bismuth

Showing 5 of 12 publications
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