Dr. Liping Ren
Project Manager at SUNY Poly SEMATECH
SPIE Involvement:
Author
Publications (7)

PROCEEDINGS ARTICLE | March 23, 2012
Proc. SPIE. 8322, Extreme Ultraviolet (EUV) Lithography III
KEYWORDS: Lithography, Optical lithography, Etching, Image processing, Silicon, Scanning electron microscopy, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Line edge roughness

PROCEEDINGS ARTICLE | April 20, 2011
Proc. SPIE. 7971, Metrology, Inspection, and Process Control for Microlithography XXV
KEYWORDS: Lithography, Metrology, Ultraviolet radiation, Photoresist materials, Scatterometry, Process control, Extreme ultraviolet, Extreme ultraviolet lithography, Critical dimension metrology, Semiconducting wafers

PROCEEDINGS ARTICLE | April 7, 2011
Proc. SPIE. 7969, Extreme Ultraviolet (EUV) Lithography II
KEYWORDS: Optical lithography, Etching, Image processing, Scanning electron microscopy, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Critical dimension metrology, Photoresist processing, Semiconducting wafers

PROCEEDINGS ARTICLE | March 20, 2010
Proc. SPIE. 7636, Extreme Ultraviolet (EUV) Lithography
KEYWORDS: Defect detection, Particles, Inspection, Wafer inspection, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Mask making, High volume manufacturing, Semiconducting wafers

PROCEEDINGS ARTICLE | March 20, 2010
Proc. SPIE. 7636, Extreme Ultraviolet (EUV) Lithography
KEYWORDS: Sensors, Argon, Electrodes, Microchannel plates, Ions, Silicon, Diagnostics, Extreme ultraviolet, Plasma, Tin

PROCEEDINGS ARTICLE | March 18, 2010
Proc. SPIE. 7636, Extreme Ultraviolet (EUV) Lithography
KEYWORDS: Optical lithography, Etching, Polymers, Glasses, Manufacturing, Resistance, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Photoresist processing

Showing 5 of 7 publications
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