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Lisa Cheung
at KLA-Tencor Corp
SPIE Involvement:
Author
Publications (1)
Proceedings Article | 24 March 2006 Paper
The use of unpatterned wafer inspection for immersion lithography defectivity studies
Frank Holsteyns, Lisa Cheung, Dieter Van Den Heuvel, Gino Marcuccilli, Gavin Simpson, Roland Brun, Andy Steinbach, Wim Fyen, Diziana Vangoidsenhoven, Paul Mertens, Mireille Maenhoudt
Proceedings Volume 6152, 61521U (2006) https://doi.org/10.1117/12.656728
KEYWORDS: Inspection, Semiconducting wafers, Scattering, Silicon, Light scattering, Immersion lithography, Signal to noise ratio, Laser scattering, Defect detection, Optical lithography
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