Dr. Lisong Dong
at Institute of Microelectronics of the CAS
SPIE Involvement:
Author
Publications (22)

Proceedings Article | 26 September 2019
Proc. SPIE. 11147, International Conference on Extreme Ultraviolet Lithography 2019
KEYWORDS: Lithography, Polishing, Deep ultraviolet, Manufacturing, Reflectivity, Photomasks, Extreme ultraviolet, Plasma etching, Extreme ultraviolet lithography, Optical proximity correction

Proceedings Article | 26 September 2019
Proc. SPIE. 11147, International Conference on Extreme Ultraviolet Lithography 2019
KEYWORDS: Lithography, Lithographic illumination, Deep ultraviolet, Reflectivity, Surface roughness, Numerical simulations, Photomasks, Extreme ultraviolet lithography, Fiber optic illuminators, Absorption

Proceedings Article | 26 September 2019
Proc. SPIE. 11147, International Conference on Extreme Ultraviolet Lithography 2019
KEYWORDS: Lithography, Genetic algorithms, Detection and tracking algorithms, Manufacturing, Image quality, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Optical proximity correction, High volume manufacturing

Proceedings Article | 26 September 2019
Proc. SPIE. 11148, Photomask Technology 2019
KEYWORDS: Lithography, Metals, Manufacturing, Optical proximity correction, Standards development

SPIE Journal Paper | 30 May 2019
JM3 Vol. 18 Issue 02
KEYWORDS: Line edge roughness, Failure analysis, Bridges, Etching, Lithography, Probability theory, Overlay metrology, Photomasks, Metals, Optical proximity correction

Showing 5 of 22 publications
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