Prof. Liyuan Wang
at Beijing Normal Univ
SPIE Involvement:
Author
Publications (11)

PROCEEDINGS ARTICLE | March 27, 2014
Proc. SPIE. 9051, Advances in Patterning Materials and Processes XXXI
KEYWORDS: Lithography, Optical lithography, Polymers, Glasses, Ultraviolet radiation, Scanning electron microscopy, Photoresist materials, Line edge roughness, Polymer thin films, Absorption

PROCEEDINGS ARTICLE | March 20, 2012
Proc. SPIE. 8325, Advances in Resist Materials and Processing Technology XXIX
KEYWORDS: Lithography, FT-IR spectroscopy, Polymers, Ultraviolet radiation, Photoresist materials, Extreme ultraviolet, Extreme ultraviolet lithography, Sodium, Photolysis, Absorption

PROCEEDINGS ARTICLE | April 16, 2011
Proc. SPIE. 7972, Advances in Resist Materials and Processing Technology XXVIII
KEYWORDS: Ultraviolet radiation, Mercury, Quantum efficiency, Lamps, Bioalcohols, Photoresist materials, Solids, Absorbance, Photolysis, Absorption

PROCEEDINGS ARTICLE | March 31, 2010
Proc. SPIE. 7639, Advances in Resist Materials and Processing Technology XXVII
KEYWORDS: Lithography, FT-IR spectroscopy, Polymers, Glasses, Nitrogen, Chemistry, Photoresist materials, Line edge roughness, Photolysis, Absorption

PROCEEDINGS ARTICLE | April 3, 2008
Proc. SPIE. 6923, Advances in Resist Materials and Processing Technology XXV
KEYWORDS: Lithography, FT-IR spectroscopy, Polymers, Mercury, Chemistry, Photoresist materials, Polymerization, Catalysis, Absorption, Chemically amplified resists

PROCEEDINGS ARTICLE | March 26, 2008
Proc. SPIE. 6923, Advances in Resist Materials and Processing Technology XXV
KEYWORDS: Lithography, Polymers, Glasses, Mercury, Organic materials, Photoresist materials, Extreme ultraviolet, Extreme ultraviolet lithography, Line edge roughness, Absorption

Showing 5 of 11 publications
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Back to Top