Loïc Schneider
at STMicroelectronics
SPIE Involvement:
Author
Publications (6)

Proceedings Article | 28 September 2017 Paper
Proc. SPIE. 10446, 33rd European Mask and Lithography Conference
KEYWORDS: Lithography, Metrology, Etching, Inspection, Scanning electron microscopy, Data processing, Process control

Proceedings Article | 28 March 2017 Presentation + Paper
Proc. SPIE. 10145, Metrology, Inspection, and Process Control for Microlithography XXXI
KEYWORDS: Metrology, Optical lithography, Sensors, Image processing, Digital filtering, Denoising, Image analysis, Scanning electron microscopy, Process control, Image filtering, Optical proximity correction, Critical dimension metrology

Proceedings Article | 22 March 2016 Paper
Proc. SPIE. 9777, Alternative Lithographic Technologies VIII
KEYWORDS: Lithography, Polymethylmethacrylate, Particles, Reliability, Computer simulations, Scanning electron microscopy, Printing, Directed self assembly, Optical proximity correction, Picosecond phenomena, Analytical research, Probability theory

Proceedings Article | 16 March 2016 Paper
Proc. SPIE. 9781, Design-Process-Technology Co-optimization for Manufacturability X
KEYWORDS: Lithography, Optical lithography, Nano opto mechanical systems, Metals, Error analysis, Manufacturing, Reliability, Printing, Monte Carlo methods, Photomasks, Directed self assembly, Double patterning technology, Optical proximity correction, Design for manufacturability

Proceedings Article | 15 March 2016 Paper
Proc. SPIE. 9780, Optical Microlithography XXIX
KEYWORDS: Lithography, Photonic devices, Waveguides, Silicon, Scanning electron microscopy, Photonics, Optical proximity correction, SRAF, Silicon photonics, Resolution enhancement technologies

Showing 5 of 6 publications
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