Lokesh Subramany
Principal Engineer at GLOBALFOUNDRIES Inc
SPIE Involvement:
Author
Publications (19)

PROCEEDINGS ARTICLE | March 24, 2017
Proc. SPIE. 10147, Optical Microlithography XXX
KEYWORDS: Lithium, Roads, Data modeling, Scanners, Optical alignment, Yield improvement, Overlay metrology

PROCEEDINGS ARTICLE | March 24, 2017
Proc. SPIE. 10147, Optical Microlithography XXX
KEYWORDS: Near infrared, Sensors, Scanners, Aluminum, Optical alignment, Laser beam diagnostics

PROCEEDINGS ARTICLE | April 21, 2016
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Reticles, Metrology, Data modeling, Deep ultraviolet, Metals, Scanners, Process control, Photomasks, Image enhancement, Semiconducting wafers, Overlay metrology

PROCEEDINGS ARTICLE | March 18, 2016
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Mathematical modeling, Metrology, Data modeling, Scanners, Process control, High volume manufacturing, Semiconducting wafers, Overlay metrology

PROCEEDINGS ARTICLE | March 8, 2016
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: MATLAB, Metrology, Scanners, Process control, Semiconductor manufacturing, High volume manufacturing, Manganese, Data centers, Semiconducting wafers, Statistical modeling, Overlay metrology

PROCEEDINGS ARTICLE | March 8, 2016
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Lithography, Diffraction, Reticles, Metrology, Error analysis, Process control, Semiconductor manufacturing, Semiconducting wafers, Overlay metrology

Showing 5 of 19 publications
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