Dr. Long He
Project Manager at SUNY Poly SEMATECH
SPIE Involvement:
Publications (14)

Proceedings Article | 17 April 2014 Paper
Proceedings Volume 9048, 90480H (2014) https://doi.org/10.1117/12.2048541
KEYWORDS: Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Inspection, Ruthenium, Failure analysis, Transmission electron microscopy, Ions, Silica, Multilayers

Proceedings Article | 11 May 2009 Paper
Proceedings Volume 7379, 73790J (2009) https://doi.org/10.1117/12.824260
KEYWORDS: Photomasks, Scanning electron microscopy, Line edge roughness, Extreme ultraviolet, Atomic force microscopy, Mirrors, Reflectivity, Extreme ultraviolet lithography, Semiconducting wafers, Optical proximity correction

Proceedings Article | 18 March 2009 Paper
Long He, John Lystad, Stefan Wurm, Kevin Orvek, Jaewoong Sohn, Andy Ma, Patrick Kearney, Steve Kolbow, David Halbmaier
Proceedings Volume 7271, 72710I (2009) https://doi.org/10.1117/12.814304
KEYWORDS: Reticles, Extreme ultraviolet, Inspection, Photomasks, Particles, Extreme ultraviolet lithography, Silica, Semiconducting wafers, Standards development, Contamination

Proceedings Article | 21 March 2008 Paper
Long He, Stefan Wurm, Phil Seidel, Kevin Orvek, Ernie Betancourt, Jon Underwood
Proceedings Volume 6921, 69211Z (2008) https://doi.org/10.1117/12.773278
KEYWORDS: Reticles, Extreme ultraviolet, Photomasks, Particles, Inspection, Extreme ultraviolet lithography, Contamination, Robotics, EUV optics, Manufacturing

Proceedings Article | 3 May 2007 Paper
Stefan Wurm, Phil Seidel, Chris Van Peski, Long He, Hakseung Han, Pat Kearney, Wonil Cho
Proceedings Volume 6533, 65330Z (2007) https://doi.org/10.1117/12.737154
KEYWORDS: Photomasks, Extreme ultraviolet, Inspection, Reticles, Defect inspection, Extreme ultraviolet lithography, Manufacturing, Semiconducting wafers, Standards development, Printing

Showing 5 of 14 publications
  • View contact details

Is this your profile? Update it now.
Don’t have a profile and want one?

Back to Top