Dr. Long He
Project Manager at SUNY Poly SEMATECH
SPIE Involvement:
Author
Publications (14)

Proceedings Article | 17 April 2014
Proc. SPIE. 9048, Extreme Ultraviolet (EUV) Lithography V
KEYWORDS: Multilayers, Silica, Ions, Inspection, Transmission electron microscopy, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Failure analysis, Ruthenium

Proceedings Article | 11 May 2009
Proc. SPIE. 7379, Photomask and Next-Generation Lithography Mask Technology XVI
KEYWORDS: Mirrors, Reflectivity, Atomic force microscopy, Scanning electron microscopy, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Optical proximity correction, Line edge roughness, Semiconducting wafers

Proceedings Article | 18 March 2009
Proc. SPIE. 7271, Alternative Lithographic Technologies
KEYWORDS: Reticles, Contamination, Silica, Particles, Inspection, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, Standards development

Proceedings Article | 21 March 2008
Proc. SPIE. 6921, Emerging Lithographic Technologies XII
KEYWORDS: Reticles, Contamination, Particles, Manufacturing, Robotics, Inspection, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, EUV optics

Proceedings Article | 3 May 2007
Proc. SPIE. 6533, 23rd European Mask and Lithography Conference
KEYWORDS: Reticles, Manufacturing, Inspection, Printing, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, Standards development, Defect inspection

Proceedings Article | 15 March 2007
Proc. SPIE. 6517, Emerging Lithographic Technologies XI
KEYWORDS: Reticles, Contamination, Particles, Robotics, Inspection, Pellicles, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Standards development

Showing 5 of 14 publications
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