Mr. Louis M. Kindt
at GLOBALFOUNDRIES Inc
SPIE Involvement:
Author
Publications (23)

PROCEEDINGS ARTICLE | July 9, 2015
Proc. SPIE. 9658, Photomask Japan 2015: Photomask and Next-Generation Lithography Mask Technology XXII
KEYWORDS: Scanners, Particles, Manufacturing, Resistance, Inspection, Reflectivity, Optical inspection, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography

PROCEEDINGS ARTICLE | March 19, 2015
Proc. SPIE. 9422, Extreme Ultraviolet (EUV) Lithography VI
KEYWORDS: Scanners, Particles, Reflectivity, Surface roughness, Pellicles, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Ruthenium, EUV optics

PROCEEDINGS ARTICLE | October 8, 2014
Proc. SPIE. 9235, Photomask Technology 2014
KEYWORDS: Multilayers, Etching, Silicon, Reflectivity, Transmission electron microscopy, Photomasks, Extreme ultraviolet, Neodymium, Molybdenum, Semiconducting wafers

PROCEEDINGS ARTICLE | October 14, 2011
Proc. SPIE. 8166, Photomask Technology 2011
KEYWORDS: Data modeling, Reflectivity, Photomasks, Extreme ultraviolet, Line width roughness, Nanoimprint lithography, Critical dimension metrology, Stray light, Semiconducting wafers, Phase shifts

PROCEEDINGS ARTICLE | October 14, 2011
Proc. SPIE. 8166, Photomask Technology 2011
KEYWORDS: Lithography, Opacity, Etching, Resistance, Inspection, Chromium, Photomasks, Optical proximity correction, SRAF, Photoresist processing

PROCEEDINGS ARTICLE | April 6, 2011
Proc. SPIE. 7969, Extreme Ultraviolet (EUV) Lithography II
KEYWORDS: Particles, Manufacturing, Reflectivity, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Critical dimension metrology, Line edge roughness, Semiconducting wafers, Ruthenium

Showing 5 of 23 publications
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Back to Top