Louis M. Kindt
at GLOBALFOUNDRIES Inc
SPIE Involvement:
Author
Publications (23)

Proceedings Article | 9 July 2015 Paper
Proc. SPIE. 9658, Photomask Japan 2015: Photomask and Next-Generation Lithography Mask Technology XXII
KEYWORDS: Scanners, Particles, Manufacturing, Resistance, Inspection, Reflectivity, Optical inspection, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography

Proceedings Article | 19 March 2015 Paper
Proc. SPIE. 9422, Extreme Ultraviolet (EUV) Lithography VI
KEYWORDS: Scanners, Particles, Reflectivity, Surface roughness, Pellicles, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Ruthenium, EUV optics

Proceedings Article | 8 October 2014 Paper
Proc. SPIE. 9235, Photomask Technology 2014
KEYWORDS: Multilayers, Etching, Silicon, Reflectivity, Transmission electron microscopy, Photomasks, Extreme ultraviolet, Neodymium, Molybdenum, Semiconducting wafers

Proceedings Article | 14 October 2011 Paper
Proc. SPIE. 8166, Photomask Technology 2011
KEYWORDS: Data modeling, Reflectivity, Photomasks, Extreme ultraviolet, Line width roughness, Nanoimprint lithography, Critical dimension metrology, Stray light, Semiconducting wafers, Phase shifts

Proceedings Article | 14 October 2011 Paper
Proc. SPIE. 8166, Photomask Technology 2011
KEYWORDS: Lithography, Opacity, Etching, Resistance, Inspection, Chromium, Photomasks, Optical proximity correction, SRAF, Photoresist processing

Showing 5 of 23 publications
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