Louis Lin
Technical Manager at Taiwan Semiconductor Manufacturing Co Ltd
SPIE Involvement:
Author
Area of Expertise:
OPC
Websites:
Publications (1)

PROCEEDINGS ARTICLE | September 9, 2013
Proc. SPIE. 8880, Photomask Technology 2013
KEYWORDS: Wafer-level optics, Image processing, Printing, Image quality, Photomasks, Optical proximity correction, SRAF, Semiconducting wafers, Bessel functions, Model-based design

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