Louis Markoya
Engineer at ASML
SPIE Involvement:
Author
Publications (6)

Proceedings Article | 7 March 2008
Proc. SPIE. 6924, Optical Microlithography XXI
KEYWORDS: Optical components, Microfluidics, Transparency, Contamination, Water, Ultraviolet radiation, Immersion lithography, Semiconducting wafers, Pulsed laser operation, Absorption

Proceedings Article | 27 March 2007
Proc. SPIE. 6520, Optical Microlithography XX
KEYWORDS: Refractive index, Microfluidics, Contamination, Water, Glasses, Immersion lithography, Critical dimension metrology, Neodymium, Semiconducting wafers, Absorption

Proceedings Article | 15 March 2006
Proc. SPIE. 6154, Optical Microlithography XIX
KEYWORDS: Refractive index, Microfluidics, Optical lithography, Water, Glasses, Immersion lithography, Critical dimension metrology, Neodymium, Semiconducting wafers, Absorption

SPIE Journal Paper | 1 July 2005
JM3 Vol. 4 Issue 03
KEYWORDS: Refractive index, Water, Oscillators, Absorption, Absorbance, Lithography, Immersion lithography, Microfluidics, Microfluidic imaging, Glasses

Proceedings Article | 4 May 2005
Proc. SPIE. 5753, Advances in Resist Technology and Processing XXII
KEYWORDS: Lithography, Refractive index, Polarization, Imaging systems, Water, Glasses, Image resolution, Printing, Immersion lithography, Absorption

Proceedings Article | 7 July 1997
Proc. SPIE. 3051, Optical Microlithography X
KEYWORDS: Lithography, Reticles, Optical lithography, Imaging systems, Image resolution, Image quality, Semiconducting wafers, Combined lens-mirror systems, Fiber optic illuminators

Showing 5 of 6 publications
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