Dr. Luc Girard
Fellow, Chief EUV Optical Engineer at Zygo Corporation
SPIE Involvement:
Author
Publications (8)

Proceedings Article | 18 March 2016 Paper
Satoshi Tanaka, Shunko Magoshi, Hidemi Kawai, Soichi Inoue, Wylie Rosenthal, Luc Girard, Lou Marchetti, Bob Kestner, John Kincade
Proceedings Volume 9776, 97761N (2016) https://doi.org/10.1117/12.2219368
KEYWORDS: Optical lithography, Extreme ultraviolet, Extreme ultraviolet lithography, Process control, Photomasks, Lithography, Optical design, Projection systems, Polarization, Mirrors, Reticles, Semiconducting wafers

Proceedings Article | 11 October 2015 Paper
Luc Girard, Lou Marchetti, Mark Bremer, Jim Kennon, Bob Kestner, Sam Hardy
Proceedings Volume 9633, 96330V (2015) https://doi.org/10.1117/12.2203138
KEYWORDS: Wavefronts, Mirrors, Optical fabrication, Optical testing, Optical alignment, Extreme ultraviolet, Reticles, Metrology, Optical coatings, Extreme ultraviolet lithography

Proceedings Article | 17 April 2014 Paper
Holger Glatzel, Dominic Ashworth, Dan Bajuk, Matt Bjork, Mark Bremer, Mark Cordier, Kevin Cummings, Luc Girard, Michael Goldstein, Eric Gullikson, Samuel Hardy, Russ Hudyma, James Kennon, Robert Kestner, Lou Marchetti, Keyvan Nouri, Patrick Naulleau, Daniel Pierce, Regina Soufli, Eberhard Spiller, Yogesh Verma
Proceedings Volume 9048, 90481K (2014) https://doi.org/10.1117/12.2048643
KEYWORDS: Mirrors, Metrology, Wavefronts, Projection systems, Aspheric lenses, Extreme ultraviolet, Extreme ultraviolet lithography, Optical coatings, Lithography, Optical fabrication

Proceedings Article | 17 April 2014 Paper
Kevin Cummings, Dominic Ashworth, Mark Bremer, Rodney Chin, Yu-Jen Fan, Luc Girard, Holger Glatzel, Michael Goldstein, Eric Gullikson, Jim Kennon, Bob Kestner, Lou Marchetti, Patrick Naulleau, Regina Soufli, Johannes Bauer, Markus Mengel, Joachim Welker, Michael Grupp, Erik Sohmen, Stefan Wurm
Proceedings Volume 9048, 90481M (2014) https://doi.org/10.1117/12.2046380
KEYWORDS: Extreme ultraviolet lithography, Extreme ultraviolet, Projection systems, Lithography, Reticles, Cameras, Artificial intelligence, Optical lithography, Wavefronts, Sensors

Proceedings Article | 1 April 2013 Paper
Holger Glatzel, Dominic Ashworth, Mark Bremer, Rodney Chin, Kevin Cummings, Luc Girard, Michael Goldstein, Eric Gullikson, Russ Hudyma, Jim Kennon, Bob Kestner, Lou Marchetti, Patrick Naulleau, Regina Soufli, Eberhard Spiller
Proceedings Volume 8679, 867917 (2013) https://doi.org/10.1117/12.2012698
KEYWORDS: Mirrors, Multilayers, Wavefronts, Extreme ultraviolet lithography, Aspheric lenses, Metrology, Extreme ultraviolet, Projection systems, Lithography, Optical testing

Showing 5 of 8 publications
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