Dr. Luc Girard
Fellow, Chief EUV Optical Engineer at Zygo Corporation
SPIE Involvement:
Author
Publications (8)

PROCEEDINGS ARTICLE | March 18, 2016
Proc. SPIE. 9776, Extreme Ultraviolet (EUV) Lithography VII
KEYWORDS: Lithography, Mirrors, Optical design, Reticles, Optical lithography, Polarization, Process control, Projection systems, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers

PROCEEDINGS ARTICLE | October 11, 2015
Proc. SPIE. 9633, Optifab 2015
KEYWORDS: Mirrors, Reticles, Metrology, Optical coatings, Wavefronts, Optical fabrication, Optical testing, Extreme ultraviolet, Extreme ultraviolet lithography, Optical alignment

PROCEEDINGS ARTICLE | April 17, 2014
Proc. SPIE. 9048, Extreme Ultraviolet (EUV) Lithography V
KEYWORDS: Lithography, Mirrors, Metrology, Optical coatings, Wavefronts, Optical fabrication, Projection systems, Aspheric lenses, Extreme ultraviolet, Extreme ultraviolet lithography

PROCEEDINGS ARTICLE | April 17, 2014
Proc. SPIE. 9048, Extreme Ultraviolet (EUV) Lithography V
KEYWORDS: Lithography, Reticles, Optical lithography, Cameras, Sensors, Wavefronts, Projection systems, Extreme ultraviolet, Artificial intelligence, Extreme ultraviolet lithography

PROCEEDINGS ARTICLE | April 1, 2013
Proc. SPIE. 8679, Extreme Ultraviolet (EUV) Lithography IV
KEYWORDS: Lithography, Mirrors, Multilayers, Metrology, Wavefronts, Optical testing, Projection systems, Aspheric lenses, Extreme ultraviolet, Extreme ultraviolet lithography

PROCEEDINGS ARTICLE | March 21, 1997
Proc. SPIE. 2871, Optical Telescopes of Today and Tomorrow
KEYWORDS: Point spread functions, Telescopes, Mirrors, Optical design, Lenses, Mercury, Light scattering, Interferometry, Charge-coupled devices, Liquids

Showing 5 of 8 publications
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