Dr. Luc Martin
Application Engineer at Aselta Nanographics
SPIE Involvement:
Author
Area of Expertise:
lithography , physics of semi conductors , microelectronics , simulation , programming
Profile Summary

I am a engineer in Physics from INSA Toulouse (National Institute of Applied Sciences FRANCE) graduated in 2007. After my diploma I joined the CEA/LETI laboratory where I prepared a thesis on a new writing strategy for electron beam direct write lithography for future technological nodes.
I am now working as an application engineer at ASELTA Nanographics, a start up company from CEA/LETI. We develop a new data preparation software for e-beam lithography (both direct write and mask making). This software covers the complete litho flow from the layout edition to the wafer map and reticle map. It also provides advanced correction strategies to improve the resolution of e-beam tools and reduce the writing time.
Publications (11)

Proceedings Article | 12 June 2018
Proc. SPIE. 10807, Photomask Japan 2018: XXV Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Electron beam lithography, Metrology, Calibration, Etching, Metals, Manufacturing, Scanning electron microscopy, Photomasks, Critical dimension metrology, Model-based design

Proceedings Article | 13 July 2017
Proc. SPIE. 10454, Photomask Japan 2017: XXIV Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Semiconductors, Lithography, Optical lithography, Databases, Photonics, Photomasks, Optical proximity correction, Silicon photonics, Algorithm development, Model-based design

Proceedings Article | 9 September 2013
Proc. SPIE. 8880, Photomask Technology 2013
KEYWORDS: Point spread functions, Detection and tracking algorithms, Scanning electron microscopy, Printing, Photomasks, Critical dimension metrology, Line edge roughness, Algorithm development, Tolerancing, Vestigial sideband modulation

Proceedings Article | 28 June 2013
Proc. SPIE. 8701, Photomask and Next-Generation Lithography Mask Technology XX
KEYWORDS: Data modeling, Modulation, Calibration, Image processing, Manufacturing, Photomasks, Optical proximity correction, Neodymium, Semiconducting wafers, Model-based design

Proceedings Article | 30 June 2012
Proc. SPIE. 8441, Photomask and Next-Generation Lithography Mask Technology XIX
KEYWORDS: Lithography, Data modeling, Modulation, Scattering, Calibration, Ions, Manufacturing, Electroluminescence, Photomasks, Extreme ultraviolet

Showing 5 of 11 publications
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