Dr. Luciana Meli
at IBM Corp
SPIE Involvement:
Conference Program Committee | Author
Publications (20)

SPIE Journal Paper | July 31, 2018
JM3 Vol. 18 Issue 01
KEYWORDS: Etching, Optical lithography, Extreme ultraviolet, Head-mounted displays, Silicon, Chemistry, Amorphous silicon, Argon, Polymers, Interfaces

PROCEEDINGS ARTICLE | April 9, 2018
Proc. SPIE. 10586, Advances in Patterning Materials and Processes XXXV
KEYWORDS: Optical lithography, Etching, Polymers, Dielectrics, Chemistry, Printing, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers

PROCEEDINGS ARTICLE | April 4, 2018
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Sensors, Calibration, Scanners, Inspection, Gas lasers, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, Tin

PROCEEDINGS ARTICLE | March 28, 2018
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Electron beam lithography, Defect detection, Modulation, Etching, Coating, Inspection, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, Stochastic processes

PROCEEDINGS ARTICLE | March 19, 2018
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Amorphous silicon, Optical lithography, Etching, Argon, Polymers, Interfaces, Silicon, Chemistry, Extreme ultraviolet, Head-mounted displays

PROCEEDINGS ARTICLE | October 16, 2017
Proc. SPIE. 10450, International Conference on Extreme Ultraviolet Lithography 2017
KEYWORDS: Optical lithography, Contamination, Coating, Manufacturing, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography

Showing 5 of 20 publications
Conference Committee Involvement (1)
Extreme Ultraviolet (EUV) Lithography X
24 February 2019 | San Jose, California, United States
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