Dr. Luciana Meli
Research Engineer at IBM Corp
SPIE Involvement:
Conference Program Committee | Author
Publications (36)

Proceedings Article | 4 May 2020
Proc. SPIE. 11325, Metrology, Inspection, and Process Control for Microlithography XXXIV
KEYWORDS: Lithography, Metrology, Data modeling, Etching, Photoresist materials, Scatterometry, Machine learning, Critical dimension metrology, Semiconducting wafers, Scatter measurement

Proceedings Article | 6 April 2020
Proc. SPIE. 11323, Extreme Ultraviolet (EUV) Lithography XI
KEYWORDS: Amorphous silicon, Lithography, Optical lithography, Etching, Scanning electron microscopy, Extreme ultraviolet, Extreme ultraviolet lithography, Critical dimension metrology, Line edge roughness, Oxidation

Proceedings Article | 24 March 2020
Proc. SPIE. 11326, Advances in Patterning Materials and Processes XXXVII

Proceedings Article | 24 March 2020
Proc. SPIE. 11323, Extreme Ultraviolet (EUV) Lithography XI
KEYWORDS: Lithography, Optical lithography, Etching, Interfaces, Photoresist materials, Extreme ultraviolet, Absorbance, Extreme ultraviolet lithography, Stochastic processes, Photoresist developing

Proceedings Article | 23 March 2020
Proc. SPIE. 11323, Extreme Ultraviolet (EUV) Lithography XI
KEYWORDS: Carbon, Contamination, Sensors, Calibration, Scanners, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers

Showing 5 of 36 publications
Conference Committee Involvement (2)
Extreme Ultraviolet (EUV) Lithography XII
21 February 2021 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography XI
24 February 2020 | San Jose, California, United States
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