Ludovic Lattard
Senior Manager at Formfactor
SPIE Involvement:
Publications (9)

Proceedings Article | 27 April 2017 Presentation
Ludovic Lattard, Isabelle Servin, Jonathan Pradelles, Yoann Blancquaert, Guido Rademaker, Laurent Pain, Guido de Boer, Pieter Brandt, Michel Dansberg, Remco J. Jager, Jerry J. Peijster, Erwin Slot, Stijn W. H. Steenbrink, Niels Vergeer, Marco Wieland
Proceedings Volume 10144, 101440N (2017)
KEYWORDS: Semiconducting wafers, Lithography, Electron beam lithography, Photomasks, Switching, Electron beams, Lithographic illumination, Integrated optics, Optical alignment, Wafer-level optics

Proceedings Article | 22 March 2016 Paper
Aurélien Fay, Clyde Browning, Pieter Brandt, Jacky Chartoire, Sébastien Bérard-Bergery, Jérôme Hazart, Alexandre Chagoya, Sergei Postnikov, Mohamed Saib, Ludovic Lattard, Patrick Schavione
Proceedings Volume 9777, 977714 (2016)
KEYWORDS: Electron beam lithography, Lithography, Optical lithography, Photoresist processing, Software development, Semiconducting wafers, Optical simulations, Electronic design automation, Data modeling, Metrology, Point spread functions, Electroluminescence, Logic, Critical dimension metrology, Calibration, Manufacturing

Proceedings Article | 22 March 2016 Paper
Marie-Line Pourteau, Isabelle Servin, Kévin Lepinay, Cyrille Essomba, Bernard Dal'Zotto, Jonathan Pradelles, Ludovic Lattard, Pieter Brandt, Marco Wieland
Proceedings Volume 9777, 977713 (2016)
KEYWORDS: Line width roughness, Lithography, Electron beam lithography, Electron beams, Scanning electron microscopy, Etching, Semiconducting wafers, Neodymium, Silicon, Surface conduction electron emitter displays

Proceedings Article | 19 March 2015 Paper
Isabelle Servin, Ndeye Arame Thiam, Patricia Pimenta-Barros, Marie-Line Pourteau, Armel-Petit Mebiene, Julien Jussot, Jonathan Pradelles, Philippe Essomba, Ludovic Lattard, Pieter Brandt, Marco Wieland
Proceedings Volume 9423, 94231C (2015)
KEYWORDS: Line width roughness, Lithography, Etching, Electron beam lithography, System on a chip, Metals, Scanning electron microscopy, Silicon, Resistance, Extreme ultraviolet

Proceedings Article | 19 March 2015 Paper
Proceedings Volume 9423, 94231Q (2015)
KEYWORDS: Lithography, Electron beam lithography, Silicon, Point spread functions, Scanning electron microscopy, Critical dimension metrology, 3D modeling, Information technology, Etching, Monte Carlo methods

Showing 5 of 9 publications
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