Prof. Ludvik Martinu
Professor at Ecole Polytechnique de Montréal
SPIE Involvement:
Conference Program Committee | Author | Instructor
Publications (11)

Proceedings Article | 8 September 2006
Proc. SPIE. 6343, Photonics North 2006
KEYWORDS: Refractive index, Silica, Waveguides, Silicon, Nd:YAG lasers, Laser ablation, Gas lasers, Photonic integrated circuits, Carbon monoxide, Absorption

Proceedings Article | 8 September 2006
Proc. SPIE. 6343, Photonics North 2006
KEYWORDS: Fabrication, Refractive index, Silica, Waveguides, Cladding, Silicon, Reflectivity, Silicon films, Gas lasers, Carbon monoxide

Proceedings Article | 8 September 2006
Proc. SPIE. 6343, Photonics North 2006
KEYWORDS: Fabrication, Microfluidics, Silica, Waveguides, Silicon, Laser ablation, Silicon films, Gas lasers, Carbon monoxide, Multiphoton lithography

Proceedings Article | 8 September 2006
Proc. SPIE. 6343, Photonics North 2006
KEYWORDS: Thin films, Microfluidics, Silica, Waveguides, Silicon, Laser processing, Laser ablation, Silicon films, Gas lasers, Carbon monoxide

Proceedings Article | 9 February 2006
Proc. SPIE. 6075, Optical Security and Counterfeit Deterrence Techniques VI
KEYWORDS: Optical filters, Visible radiation, Reflection, Sputter deposition, Ion beams, Color difference, Light sources and illumination, Image filtering, Dielectric filters, Tantalum

Showing 5 of 11 publications
Conference Committee Involvement (5)
Advances in Optical Thin Films VI
14 May 2018 | Frankfurt, Germany
Advances in Optical Thin Films IV
5 September 2011 | Marseille, France
Advances in Optical Thin Films III
2 September 2008 | Glasgow, Scotland, United Kingdom
Advances in Optical Thin Films II
13 September 2005 | Jena, Germany
Advances in Optical Thin Films
30 September 2003 | St. Etienne, France
Course Instructor
SC923: From Understanding the Growth Of Optical Films to a Judicious Control of their Performance
This course provides the most recent background and understanding of two important aspects necessary for further advances in optical coatings: A) Effect of energetic ion- and photon-induced reactions at the surface during the film growth by different complementary techniques including ion (beam) assisted deposition (IAD or IBAD), balanced and unbalanced magnetron sputtering (BMS and UMS), dual ion beam sputtering (DIBS), filtered cathodic arc deposition (FCAD), and plasma-enhanced chemical vapor deposition (PECVD), while concentrating on the most recent pulsed-discharge processes and time- and spatially-resolved diagnostic methods. This includes the principles and capabilities of the microstructural characterization methods suitable for materials assessment, for process optimization and for reverse engineering. B) Metrology of the mechanical, tribological and other functional properties of optical films and their long term stability in various temperature, radiative and environmental conditions. It makes a link between the optical, mechanical and other characteristics, the film microstructure and the film growth mechanisms, allowing one to better perform film system optimization. This is illustrated by numerous practical examples of filter performance with discrete and graded designs ranging from antireflective coatings to complex telecom and astronomical filters to the optical coatings on plastics.
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