Dr. Luigi Scaccabarozzi
Research Assistent at ASML Netherlands BV
SPIE Involvement:
Author
Publications (6)

PROCEEDINGS ARTICLE | July 9, 2015
Proc. SPIE. 9658, Photomask Japan 2015: Photomask and Next-Generation Lithography Mask Technology XXII
KEYWORDS: Reticles, Scanners, Particles, Resistance, Pellicles, Finite element methods, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, Protactinium

PROCEEDINGS ARTICLE | April 17, 2014
Proc. SPIE. 9048, Extreme Ultraviolet (EUV) Lithography V
KEYWORDS: Reticles, Particles, Silicon, Manufacturing, Pellicles, Extreme ultraviolet, Critical dimension metrology, Semiconducting wafers, Prototyping, Protactinium

PROCEEDINGS ARTICLE | April 1, 2013
Proc. SPIE. 8679, Extreme Ultraviolet (EUV) Lithography IV
KEYWORDS: Reticles, Scanners, Ultraviolet radiation, Particles, Manufacturing, Pellicles, Extreme ultraviolet, Extreme ultraviolet lithography, Neodymium, Semiconducting wafers

PROCEEDINGS ARTICLE | February 10, 2006
Proc. SPIE. 6103, Nonlinear Frequency Generation and Conversion: Materials, Devices, and Applications V
KEYWORDS: Fabry–Perot interferometers, Second-harmonic generation, Waveguides, Germanium, Gallium arsenide, Aluminum, Phase matching, Harmonic generation, Semiconducting wafers, Gallium

PROCEEDINGS ARTICLE | March 31, 2005
Proc. SPIE. 5728, Integrated Optics: Devices, Materials, and Technologies IX
KEYWORDS: Fabry–Perot interferometers, Waveguides, Cladding, Etching, Photonic crystals, Chromium, Wave propagation, Nonlinear optics, Aluminum, Optical microcavities

PROCEEDINGS ARTICLE | May 28, 2004
Proc. SPIE. 5355, Integrated Optics: Devices, Materials, and Technologies VIII
KEYWORDS: Electron beam lithography, Waveguides, Etching, Gallium arsenide, Photonic crystals, Nonlinear optics, Photomasks, Aluminum, Frequency conversion, Optical microcavities

Showing 5 of 6 publications
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